Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser

S.P. Hau-Riege; R.A. London; A. Graf; S.L. Baker; R. Soufli; R. Sobierajski; T. Burian; J. Chalupsky; L. Juha; J. Gaudin; J. Krzywinski; S. Moeller; M. Messerschmidt; J. Bozek; C. Bostedt

doi:10.1364/OE.18.023933

Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser

S.P. Hau-Riege, R.A. London, A. Graf, S.L. Baker, R. Soufli, R. Sobierajski, T. Burian, J. Chalupsky, L. Juha, J. Gaudin, J. Krzywinski, S. Moeller, M. Messerschmidt, J. Bozek, C. Bostedt

XUV Optics

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Abstract

Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays.

Original language	English
Pages (from-to)	23933-23938
Journal	Optics express
Volume	18
Issue number	23
DOIs	https://doi.org/10.1364/OE.18.023933
Publication status	Published - 2010

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Hau-Riege, S. P., London, R. A., Graf, A., Baker, S. L., Soufli, R., Sobierajski, R., Burian, T., Chalupsky, J., Juha, L., Gaudin, J., Krzywinski, J., Moeller, S., Messerschmidt, M., Bozek, J., & Bostedt, C. (2010). Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser. Optics express, 18(23), 23933-23938. https://doi.org/10.1364/OE.18.023933

@article{6425c43d7b244f3e8d7d803bdc70110c,

title = "Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser",

abstract = "Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays.",

author = "S.P. Hau-Riege and R.A. London and A. Graf and S.L. Baker and R. Soufli and R. Sobierajski and T. Burian and J. Chalupsky and L. Juha and J. Gaudin and J. Krzywinski and S. Moeller and M. Messerschmidt and J. Bozek and C. Bostedt",

year = "2010",

doi = "10.1364/OE.18.023933",

language = "English",

volume = "18",

pages = "23933--23938",

journal = "Optics express",

issn = "1094-4087",

publisher = "The Optical Society",

number = "23",

}

Hau-Riege, SP, London, RA, Graf, A, Baker, SL, Soufli, R, Sobierajski, R, Burian, T, Chalupsky, J, Juha, L, Gaudin, J, Krzywinski, J, Moeller, S, Messerschmidt, M, Bozek, J & Bostedt, C 2010, 'Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser', Optics express, vol. 18, no. 23, pp. 23933-23938. https://doi.org/10.1364/OE.18.023933

TY - JOUR

T1 - Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser

AU - Hau-Riege, S.P.

AU - London, R.A.

AU - Graf, A.

AU - Baker, S.L.

AU - Soufli, R.

AU - Sobierajski, R.

AU - Burian, T.

AU - Chalupsky, J.

AU - Juha, L.

AU - Gaudin, J.

AU - Krzywinski, J.

AU - Moeller, S.

AU - Messerschmidt, M.

AU - Bozek, J.

AU - Bostedt, C.

PY - 2010

Y1 - 2010

N2 - Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays.

AB - Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays.

U2 - 10.1364/OE.18.023933

DO - 10.1364/OE.18.023933

M3 - Article

VL - 18

SP - 23933

EP - 23938

JO - Optics express

JF - Optics express

SN - 1094-4087

IS - 23

ER -

Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser

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