Intrinsic stress of PECVD silicon oxynitride films deposited in a hot-wall reactor

Kamal Aïte, R. Koekoek

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationMaterial Research Society Symposium
    Place of PublicationBoston, USA
    Pages85-90
    Number of pages6
    Publication statusPublished - 1 Sep 1990

    Keywords

    • METIS-114024

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