Intrinsic stress of PECVD silicon oxynitride films deposited in a hot-wall reactor

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	Undefined
Title of host publication	Material Research Society Symposium
Place of Publication	Boston, USA
Pages	85-90
Number of pages	6
Publication status	Published - 1 Sept 1990

Keywords

@inproceedings{be5b28651be8412b9572be159c6ba0db,

title = "Intrinsic stress of PECVD silicon oxynitride films deposited in a hot-wall reactor",

keywords = "METIS-114024",

author = "Kamal A{\"i}te and R. Koekoek",

year = "1990",

month = sep,

day = "1",

language = "Undefined",

pages = "85--90",

booktitle = "Material Research Society Symposium",

}