Abstract
Material degradation in EUV is not yet fully understood due to the dependence on its electronic structure. We investigate the degradation of transition metal (TM) oxide (TMO) cap layers during EUV exposure. We hypothesize oxygen release from a TMO due to Auger decay, oxidizing the underlayer (SiNx), if a TM atom has no free valence electrons (VE). Inversely a TM atom with free VE is stable in EUV.
Original language | English |
---|---|
Number of pages | 1 |
Publication status | Published - 12 Dec 2024 |
Event | 16th BESSY@HZB User Meeting 2024 - Berlin, Germany Duration: 11 Dec 2024 → 12 Dec 2024 Conference number: 16 |
Conference
Conference | 16th BESSY@HZB User Meeting 2024 |
---|---|
Country/Territory | Germany |
City | Berlin |
Period | 11/12/24 → 12/12/24 |
Keywords
- Extreme ultraviolet (EUV)
- Transition metal oxides
- Auger decay
- EUV lithography