Investigation of the microstructure of ramp-type YBa2Cu3O7-delta structures

H. Sato; H. Sato; F.J.G. Roesthuis; A.H. Sonnenberg; Augustinus J.H.M. Rijnders; Horst Rogalla; David H.A. Blank

doi:10.1088/0953-2048/13/5/319

Investigation of the microstructure of ramp-type YBa2Cu3O7-delta structures

H. Sato, H. Sato, F.J.G. Roesthuis, A.H. Sonnenberg, Augustinus J.H.M. Rijnders, Horst Rogalla, David H.A. Blank

Research output: Contribution to journal › Article › Academic › peer-review

2 Citations (Scopus)

10 Downloads (Pure)

Abstract

We studied the morphology of ramps in YBa2Cu3O7-δ films and, subsequently, the barrier layer. The ramps have been fabricated by Ar ion beam milling using standard photoresist masks. SEM and AFM showed the formation of tracks along the slope of the ramp, originating from the irregular shape of the edge of the photoresist mask. A proposed modified reflowed resist and pre-annealing process show a significantly smoother ramp surface, important for the fabrication of reproducible Josephson junctions.

Original language	Undefined
Pages (from-to)	522-526
Number of pages	5
Journal	Superconductor science and technology
Volume	13
Issue number	5
DOIs	https://doi.org/10.1088/0953-2048/13/5/319
Publication status	Published - 2000

Keywords

METIS-128787
IR-23988

Access to Document

10.1088/0953-2048/13/5/319

Cite this

@article{c24f47fa3ed94943a1f36752e57e7bdf,

title = "Investigation of the microstructure of ramp-type YBa2Cu3O7-delta structures",

abstract = "We studied the morphology of ramps in YBa2Cu3O7-δ films and, subsequently, the barrier layer. The ramps have been fabricated by Ar ion beam milling using standard photoresist masks. SEM and AFM showed the formation of tracks along the slope of the ramp, originating from the irregular shape of the edge of the photoresist mask. A proposed modified reflowed resist and pre-annealing process show a significantly smoother ramp surface, important for the fabrication of reproducible Josephson junctions.",

keywords = "METIS-128787, IR-23988",

author = "H. Sato and H. Sato and F.J.G. Roesthuis and A.H. Sonnenberg and Rijnders, {Augustinus J.H.M.} and Horst Rogalla and Blank, {David H.A.}",

year = "2000",

doi = "10.1088/0953-2048/13/5/319",

language = "Undefined",

volume = "13",

pages = "522--526",

journal = "Superconductor science and technology",

issn = "0953-2048",

publisher = "Institute of Physics (IOP)",

number = "5",

}

TY - JOUR

T1 - Investigation of the microstructure of ramp-type YBa2Cu3O7-delta structures

AU - Sato, H.

AU - Roesthuis, F.J.G.

AU - Sonnenberg, A.H.

AU - Rijnders, Augustinus J.H.M.

AU - Rogalla, Horst

AU - Blank, David H.A.

PY - 2000

Y1 - 2000

N2 - We studied the morphology of ramps in YBa2Cu3O7-δ films and, subsequently, the barrier layer. The ramps have been fabricated by Ar ion beam milling using standard photoresist masks. SEM and AFM showed the formation of tracks along the slope of the ramp, originating from the irregular shape of the edge of the photoresist mask. A proposed modified reflowed resist and pre-annealing process show a significantly smoother ramp surface, important for the fabrication of reproducible Josephson junctions.

AB - We studied the morphology of ramps in YBa2Cu3O7-δ films and, subsequently, the barrier layer. The ramps have been fabricated by Ar ion beam milling using standard photoresist masks. SEM and AFM showed the formation of tracks along the slope of the ramp, originating from the irregular shape of the edge of the photoresist mask. A proposed modified reflowed resist and pre-annealing process show a significantly smoother ramp surface, important for the fabrication of reproducible Josephson junctions.

KW - METIS-128787

KW - IR-23988

U2 - 10.1088/0953-2048/13/5/319

DO - 10.1088/0953-2048/13/5/319

M3 - Article

SN - 0953-2048

VL - 13

SP - 522

EP - 526

JO - Superconductor science and technology

JF - Superconductor science and technology

IS - 5

ER -