Abstract
We investigated the thermal stability of e-beam deposited Mo/B 4C/Si/B 4C layered systems, with and without ion assistance during the growth of the B 4C diffusion barrier layers. The thermal stability was investigated by in situ thermal annealing during grazing incidence X-ray reflection. By studying partially treated B 4C barrier layers, we found that the improvement in thermal stability is caused by an enhanced density of the B 4C layer. © 2012 American Institute of Physics.
Original language | English |
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Article number | 064303 |
Pages (from-to) | 064303-1-064303-5 |
Number of pages | 5 |
Journal | Journal of Applied Physics |
Volume | 111 |
Issue number | 6 |
DOIs | |
Publication status | Published - 16 Mar 2012 |
Keywords
- IR-81722
- METIS-288368