Ion-enhanced growth in planar and structured Mo/Si multilayers

Toine van den Boogaard

Research output: ThesisPhD Thesis - Research external, graduation UTAcademic

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Abstract

Nanoscale molybdenum/silicon (Mo/Si) multilayer structures are employed as reflective optical elements for wavelengths in the extreme ultraviolet (EUV, =13.5 nm). When using appropriate ion-beam parameters, Kr+ bombardment and sputtering of a-Si layers is known to suppress layer growth intrinsic roughness in Mo/Si multilayers. In chapter 2 the scalability of the smoothing process is investigated, aiming for optimization suppression of substrate roughness. In chapter 3 is reported on modifications of the in-layer structure of a-Si layers by implantation of H+ ions. The resulting increased layer porosity is found to enhance Kr+-induced smoothing, towards ultrasmooth surfaces. In chapter 4 the interface roughness in Mo/Si multilayers as a function of the noble gas ion polishing species (Ne, Ar, Kr, and Xe) is investigated by grazing incidence small angle x-ray scattering (GISAXS). Optimal interface smoothness is obtained by Xe+ polishing, however, Kr+ polishing yields highest EUV reflectance. This is clarified by the residual amounts of polishing gas in the Si layers, affecting the optical constants. Chapter 5 discusses the application of an EUV reflective multilayer on a non-flat, grating substrate, which is appealing as a high EUV throughput optical filtering device. The deposition of multilayers onto non-flat substrate topographies as a model system for real gratings, is described in chapter 6. With these findings, multilayer deposition on a grating is shown feasible. However, the tolerances on grating roughness and flatness of the facets are extremely tight. In chapter 7 a deposition scheme of a class of rectangular grating phaseshift reflectors on flat substrates is reported.
Original languageEnglish
Awarding Institution
  • University of Twente
Supervisors/Advisors
  • Bijkerk, Fred, Supervisor
Award date13 Dec 2011
Place of PublicationEnschede
Publisher
Print ISBNs978-94-6191-120-9
Publication statusPublished - 13 Dec 2011

Fingerprint

molybdenum
polishing
gratings
silicon
roughness
ions
smoothing
flatness
x ray scattering
grazing incidence
laminates
reflectors
bombardment
rare gases
flat surfaces
implantation
topography
sputtering
ion beams
retarding

Keywords

  • METIS-284463
  • IR-78771

Cite this

van den Boogaard, T. (2011). Ion-enhanced growth in planar and structured Mo/Si multilayers. Enschede: Universiteit Twente.
van den Boogaard, Toine. / Ion-enhanced growth in planar and structured Mo/Si multilayers. Enschede : Universiteit Twente, 2011. 104 p.
@phdthesis{5d4c770d04d7464fb244f8cc612b6e88,
title = "Ion-enhanced growth in planar and structured Mo/Si multilayers",
abstract = "Nanoscale molybdenum/silicon (Mo/Si) multilayer structures are employed as reflective optical elements for wavelengths in the extreme ultraviolet (EUV, =13.5 nm). When using appropriate ion-beam parameters, Kr+ bombardment and sputtering of a-Si layers is known to suppress layer growth intrinsic roughness in Mo/Si multilayers. In chapter 2 the scalability of the smoothing process is investigated, aiming for optimization suppression of substrate roughness. In chapter 3 is reported on modifications of the in-layer structure of a-Si layers by implantation of H+ ions. The resulting increased layer porosity is found to enhance Kr+-induced smoothing, towards ultrasmooth surfaces. In chapter 4 the interface roughness in Mo/Si multilayers as a function of the noble gas ion polishing species (Ne, Ar, Kr, and Xe) is investigated by grazing incidence small angle x-ray scattering (GISAXS). Optimal interface smoothness is obtained by Xe+ polishing, however, Kr+ polishing yields highest EUV reflectance. This is clarified by the residual amounts of polishing gas in the Si layers, affecting the optical constants. Chapter 5 discusses the application of an EUV reflective multilayer on a non-flat, grating substrate, which is appealing as a high EUV throughput optical filtering device. The deposition of multilayers onto non-flat substrate topographies as a model system for real gratings, is described in chapter 6. With these findings, multilayer deposition on a grating is shown feasible. However, the tolerances on grating roughness and flatness of the facets are extremely tight. In chapter 7 a deposition scheme of a class of rectangular grating phaseshift reflectors on flat substrates is reported.",
keywords = "METIS-284463, IR-78771",
author = "{van den Boogaard}, Toine",
year = "2011",
month = "12",
day = "13",
language = "English",
isbn = "978-94-6191-120-9",
publisher = "Universiteit Twente",
school = "University of Twente",

}

van den Boogaard, T 2011, 'Ion-enhanced growth in planar and structured Mo/Si multilayers', University of Twente, Enschede.

Ion-enhanced growth in planar and structured Mo/Si multilayers. / van den Boogaard, Toine.

Enschede : Universiteit Twente, 2011. 104 p.

Research output: ThesisPhD Thesis - Research external, graduation UTAcademic

TY - THES

T1 - Ion-enhanced growth in planar and structured Mo/Si multilayers

AU - van den Boogaard, Toine

PY - 2011/12/13

Y1 - 2011/12/13

N2 - Nanoscale molybdenum/silicon (Mo/Si) multilayer structures are employed as reflective optical elements for wavelengths in the extreme ultraviolet (EUV, =13.5 nm). When using appropriate ion-beam parameters, Kr+ bombardment and sputtering of a-Si layers is known to suppress layer growth intrinsic roughness in Mo/Si multilayers. In chapter 2 the scalability of the smoothing process is investigated, aiming for optimization suppression of substrate roughness. In chapter 3 is reported on modifications of the in-layer structure of a-Si layers by implantation of H+ ions. The resulting increased layer porosity is found to enhance Kr+-induced smoothing, towards ultrasmooth surfaces. In chapter 4 the interface roughness in Mo/Si multilayers as a function of the noble gas ion polishing species (Ne, Ar, Kr, and Xe) is investigated by grazing incidence small angle x-ray scattering (GISAXS). Optimal interface smoothness is obtained by Xe+ polishing, however, Kr+ polishing yields highest EUV reflectance. This is clarified by the residual amounts of polishing gas in the Si layers, affecting the optical constants. Chapter 5 discusses the application of an EUV reflective multilayer on a non-flat, grating substrate, which is appealing as a high EUV throughput optical filtering device. The deposition of multilayers onto non-flat substrate topographies as a model system for real gratings, is described in chapter 6. With these findings, multilayer deposition on a grating is shown feasible. However, the tolerances on grating roughness and flatness of the facets are extremely tight. In chapter 7 a deposition scheme of a class of rectangular grating phaseshift reflectors on flat substrates is reported.

AB - Nanoscale molybdenum/silicon (Mo/Si) multilayer structures are employed as reflective optical elements for wavelengths in the extreme ultraviolet (EUV, =13.5 nm). When using appropriate ion-beam parameters, Kr+ bombardment and sputtering of a-Si layers is known to suppress layer growth intrinsic roughness in Mo/Si multilayers. In chapter 2 the scalability of the smoothing process is investigated, aiming for optimization suppression of substrate roughness. In chapter 3 is reported on modifications of the in-layer structure of a-Si layers by implantation of H+ ions. The resulting increased layer porosity is found to enhance Kr+-induced smoothing, towards ultrasmooth surfaces. In chapter 4 the interface roughness in Mo/Si multilayers as a function of the noble gas ion polishing species (Ne, Ar, Kr, and Xe) is investigated by grazing incidence small angle x-ray scattering (GISAXS). Optimal interface smoothness is obtained by Xe+ polishing, however, Kr+ polishing yields highest EUV reflectance. This is clarified by the residual amounts of polishing gas in the Si layers, affecting the optical constants. Chapter 5 discusses the application of an EUV reflective multilayer on a non-flat, grating substrate, which is appealing as a high EUV throughput optical filtering device. The deposition of multilayers onto non-flat substrate topographies as a model system for real gratings, is described in chapter 6. With these findings, multilayer deposition on a grating is shown feasible. However, the tolerances on grating roughness and flatness of the facets are extremely tight. In chapter 7 a deposition scheme of a class of rectangular grating phaseshift reflectors on flat substrates is reported.

KW - METIS-284463

KW - IR-78771

M3 - PhD Thesis - Research external, graduation UT

SN - 978-94-6191-120-9

PB - Universiteit Twente

CY - Enschede

ER -

van den Boogaard T. Ion-enhanced growth in planar and structured Mo/Si multilayers. Enschede: Universiteit Twente, 2011. 104 p.