Ion implantation defect characterization by high-resolution X-ray diffraction

J.G.E. Klappe, I. Barsony, T.W. Ryan

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings Symposium Materials Research Society, Vol. 262
    Place of PublicationSan Francisco
    Pages1121-1126
    Number of pages0
    Publication statusPublished - 26 Apr 1992

    Keywords

    • METIS-114008

    Cite this

    Klappe, J. G. E., Barsony, I., & Ryan, T. W. (1992). Ion implantation defect characterization by high-resolution X-ray diffraction. In Proceedings Symposium Materials Research Society, Vol. 262 (pp. 1121-1126). San Francisco.