Issues of laser plasma sources for soft x-ray projection lithography

L. Shmaenok*, F. Bijkerk, E. Louis, A. van Honk, M. J. van der Wiel, Yu Platonov, A. Shevelko, A. Mitrofanov, H. Frowein, B. Nicolaus, F. Voß, R. Désor

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

6 Citations (Scopus)
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Results of optimization of an excimer laser-induced plasma x-ray source for projection lithography in the range λ = 13-15 nm are reported. A conversion efficiency of >0.7% in 2% BW has been achieved with high-Z target materials. Two methods of reducing contamination of optical elements by target debris have been tested: usage of a thin target layer (for Ta 1 μm was found to be optimal) and of a heavy buffer gas. The effect of the use of Ta-tape target and Kr buffer gas has been measured by determining the reflectivity of a Mo-Si multilayer sample after 105 shots.

Original languageEnglish
Pages (from-to)211-214
Number of pages4
JournalMicroelectronic engineering
Issue number1-4
Publication statusPublished - 1 Jan 1994
Externally publishedYes


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