Kinetic roughening of vicinal Si(001)

P.E. Hegeman, Henricus J.W. Zandvliet, Gerhardus A.M. Kip, Arend van Silfhout

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The kinetic roughening behavior of vicinal Si(001) surfaces is studied with scanning tunneling microscopy. By analyzing the height-height correlation function of the Si layers that have been grown we found, in the case of islands growth, an algebraic roughening behavior with a roughness exponent of 0.68 ± 0.05. In the step flow mode, however, we found non-algebraic roughening behavior.
Original languageEnglish
Pages (from-to)L655-L660
Number of pages6
JournalSurface science
Issue number1-2
Publication statusPublished - 1994


  • IR-24074
  • METIS-128873


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