Kinetics and morphology of electrochemical vapour deposited thin zirconia/yttria layers on porous substrates

H.W. Brinkman, H.W. Brinkman, J. Meijerink, J. Meijerink, K.J. de Vries, Karel Jan de Vries, Anthonie Burggraaf, A.J. Burggraaf

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Abstract

By means of electrochemical vapour deposition (EVD), it is possible to grow thin (0.5-5 µm), dense zirconia/yttria layers on porous ceramic substrates. Kinetics of the EVD process, morphology and oxygen permeation properties of the grown layers are investigated. Very thin (~ 0.5 µm) layers are grown at relatively low temperatures (700-800 °C). Water vapour as reactant enhances the surface reaction rate at the solid oxide/oxygen source reactant interface. A transition occurs from pore diffusion (above 1000 °C) to bulk electrochemical diffusion (below 900 °C) as rate-limiting step for layer growth. The zirconia/yttria solid solution is mainly deposited in the cubic phase; the layers grow in a typical columnar way and are polycrystalline. Oxygen permeation measurements show that the oxygen permeation flux through the zirconia/yttria layers is influenced by the layer thickness, morphology, presence of water vapour and the oxygen pressure gradient over the layer.
Original languageUndefined
Pages (from-to)587-600
Number of pages13
JournalJournal of the European Ceramic Society
Volume16
Issue number16
DOIs
Publication statusPublished - 1996

Keywords

  • IR-12135
  • METIS-106511

Cite this

Brinkman, H. W., Brinkman, H. W., Meijerink, J., Meijerink, J., de Vries, K. J., de Vries, K. J., ... Burggraaf, A. J. (1996). Kinetics and morphology of electrochemical vapour deposited thin zirconia/yttria layers on porous substrates. Journal of the European Ceramic Society, 16(16), 587-600. https://doi.org/10.1016/0955-2219(95)00173-5
Brinkman, H.W. ; Brinkman, H.W. ; Meijerink, J. ; Meijerink, J. ; de Vries, K.J. ; de Vries, Karel Jan ; Burggraaf, Anthonie ; Burggraaf, A.J. / Kinetics and morphology of electrochemical vapour deposited thin zirconia/yttria layers on porous substrates. In: Journal of the European Ceramic Society. 1996 ; Vol. 16, No. 16. pp. 587-600.
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title = "Kinetics and morphology of electrochemical vapour deposited thin zirconia/yttria layers on porous substrates",
abstract = "By means of electrochemical vapour deposition (EVD), it is possible to grow thin (0.5-5 µm), dense zirconia/yttria layers on porous ceramic substrates. Kinetics of the EVD process, morphology and oxygen permeation properties of the grown layers are investigated. Very thin (~ 0.5 µm) layers are grown at relatively low temperatures (700-800 °C). Water vapour as reactant enhances the surface reaction rate at the solid oxide/oxygen source reactant interface. A transition occurs from pore diffusion (above 1000 °C) to bulk electrochemical diffusion (below 900 °C) as rate-limiting step for layer growth. The zirconia/yttria solid solution is mainly deposited in the cubic phase; the layers grow in a typical columnar way and are polycrystalline. Oxygen permeation measurements show that the oxygen permeation flux through the zirconia/yttria layers is influenced by the layer thickness, morphology, presence of water vapour and the oxygen pressure gradient over the layer.",
keywords = "IR-12135, METIS-106511",
author = "H.W. Brinkman and H.W. Brinkman and J. Meijerink and J. Meijerink and {de Vries}, K.J. and {de Vries}, {Karel Jan} and Anthonie Burggraaf and A.J. Burggraaf",
year = "1996",
doi = "10.1016/0955-2219(95)00173-5",
language = "Undefined",
volume = "16",
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journal = "Journal of the European Ceramic Society",
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Brinkman, HW, Brinkman, HW, Meijerink, J, Meijerink, J, de Vries, KJ, de Vries, KJ, Burggraaf, A & Burggraaf, AJ 1996, 'Kinetics and morphology of electrochemical vapour deposited thin zirconia/yttria layers on porous substrates' Journal of the European Ceramic Society, vol. 16, no. 16, pp. 587-600. https://doi.org/10.1016/0955-2219(95)00173-5

Kinetics and morphology of electrochemical vapour deposited thin zirconia/yttria layers on porous substrates. / Brinkman, H.W.; Brinkman, H.W.; Meijerink, J.; Meijerink, J.; de Vries, K.J.; de Vries, Karel Jan; Burggraaf, Anthonie; Burggraaf, A.J.

In: Journal of the European Ceramic Society, Vol. 16, No. 16, 1996, p. 587-600.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Kinetics and morphology of electrochemical vapour deposited thin zirconia/yttria layers on porous substrates

AU - Brinkman, H.W.

AU - Brinkman, H.W.

AU - Meijerink, J.

AU - Meijerink, J.

AU - de Vries, K.J.

AU - de Vries, Karel Jan

AU - Burggraaf, Anthonie

AU - Burggraaf, A.J.

PY - 1996

Y1 - 1996

N2 - By means of electrochemical vapour deposition (EVD), it is possible to grow thin (0.5-5 µm), dense zirconia/yttria layers on porous ceramic substrates. Kinetics of the EVD process, morphology and oxygen permeation properties of the grown layers are investigated. Very thin (~ 0.5 µm) layers are grown at relatively low temperatures (700-800 °C). Water vapour as reactant enhances the surface reaction rate at the solid oxide/oxygen source reactant interface. A transition occurs from pore diffusion (above 1000 °C) to bulk electrochemical diffusion (below 900 °C) as rate-limiting step for layer growth. The zirconia/yttria solid solution is mainly deposited in the cubic phase; the layers grow in a typical columnar way and are polycrystalline. Oxygen permeation measurements show that the oxygen permeation flux through the zirconia/yttria layers is influenced by the layer thickness, morphology, presence of water vapour and the oxygen pressure gradient over the layer.

AB - By means of electrochemical vapour deposition (EVD), it is possible to grow thin (0.5-5 µm), dense zirconia/yttria layers on porous ceramic substrates. Kinetics of the EVD process, morphology and oxygen permeation properties of the grown layers are investigated. Very thin (~ 0.5 µm) layers are grown at relatively low temperatures (700-800 °C). Water vapour as reactant enhances the surface reaction rate at the solid oxide/oxygen source reactant interface. A transition occurs from pore diffusion (above 1000 °C) to bulk electrochemical diffusion (below 900 °C) as rate-limiting step for layer growth. The zirconia/yttria solid solution is mainly deposited in the cubic phase; the layers grow in a typical columnar way and are polycrystalline. Oxygen permeation measurements show that the oxygen permeation flux through the zirconia/yttria layers is influenced by the layer thickness, morphology, presence of water vapour and the oxygen pressure gradient over the layer.

KW - IR-12135

KW - METIS-106511

U2 - 10.1016/0955-2219(95)00173-5

DO - 10.1016/0955-2219(95)00173-5

M3 - Article

VL - 16

SP - 587

EP - 600

JO - Journal of the European Ceramic Society

JF - Journal of the European Ceramic Society

SN - 0955-2219

IS - 16

ER -