Kinetics of Polycrystalline Tungsten and Silicon CVD

J. Holleman

    Research output: Thesis › PhD Thesis - Research UT, graduation UT › Academic

    Original languageUndefined
    Awarding Institution
    • University of Twente
    Supervisors/Advisors
    • Popma, T.J.A., Supervisor
    • Verweij, J.F., Supervisor
    Award date26 Feb 1993
    Place of PublicationEnschede
    Publisher
    Print ISBNs90-9005797-8
    Publication statusPublished - 26 Feb 1993

    Keywords

    • METIS-111433

    Cite this

    Holleman, J. (1993). Kinetics of Polycrystalline Tungsten and Silicon CVD. Enschede: Universiteit Twente.
    Holleman, J.. / Kinetics of Polycrystalline Tungsten and Silicon CVD. Enschede : Universiteit Twente, 1993. 114 p.
    @phdthesis{7aa806b073c34e108250ef5536eba381,
    title = "Kinetics of Polycrystalline Tungsten and Silicon CVD",
    keywords = "METIS-111433",
    author = "J. Holleman",
    year = "1993",
    month = "2",
    day = "26",
    language = "Undefined",
    isbn = "90-9005797-8",
    publisher = "Universiteit Twente",
    school = "University of Twente",

    }

    Holleman, J 1993, 'Kinetics of Polycrystalline Tungsten and Silicon CVD', University of Twente, Enschede.

    Kinetics of Polycrystalline Tungsten and Silicon CVD. / Holleman, J.

    Enschede : Universiteit Twente, 1993. 114 p.

    Research output: Thesis › PhD Thesis - Research UT, graduation UT › Academic

    TY - THES

    T1 - Kinetics of Polycrystalline Tungsten and Silicon CVD

    AU - Holleman, J.

    PY - 1993/2/26

    Y1 - 1993/2/26

    KW - METIS-111433

    M3 - PhD Thesis - Research UT, graduation UT

    SN - 90-9005797-8

    PB - Universiteit Twente

    CY - Enschede

    ER -

    Holleman J. Kinetics of Polycrystalline Tungsten and Silicon CVD. Enschede: Universiteit Twente, 1993. 114 p.