Kinetics of the Low Pressure Chemical Vapor Deposition of Polycrystalline Germanium-Silicon Alloys from SiH4 and GeH4

J. Holleman, A.E.T. Kuiper, J.F. Verweij, J.F. Verweij

    Research output: Contribution to journalArticleAcademicpeer-review

    14 Citations (Scopus)
    88 Downloads (Pure)

    Fingerprint

    Dive into the research topics of 'Kinetics of the Low Pressure Chemical Vapor Deposition of Polycrystalline Germanium-Silicon Alloys from SiH4 and GeH4'. Together they form a unique fingerprint.