Laminated CeO2/HfO2 High-K Gate Dielectrics Grown by Pulsed Laser Deposition in Reducing Ambient

K. Karakaya, B. Barcones Campo, A. Zinine, Z.M. Rittersma, P. Graat, J.G.M. van Berkum, M.A. Verheijen, Augustinus J.H.M. Rijnders, David H.A. Blank

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