Abstract
We measured electron density and electron energy distribution function (EEDS) vertically through our reactor for a range of process conditions and for various gases. The EEDF of Ar plasma in the reactor could largely be described by the Maxwell-Boltzmann distribution function, but it also contained a fraction (~10-3) of electrons which were much faster (20-40 eV). At low pressures (6.8-11 µbar), the tail of fast electrons shifted to higher energies (Emax ~50 eV) as we measured more towards the chuck.
This tail of fast electrons could be shifted to lower energies (Emax ~30 eV) when we increased pressure to 120 µbar or applied an external magnetic field of 9.5 µT. Addition of small amounts of N2 (1-10%) or N2O (5%) to Ar plasma lowered the total density of slow electrons (approx. by a factor two) but did not change the shape of the fast-electron tail of the EEDF.
The ionization degree of Ar-plasma increased from 2.5 104 to 5 104 when an external magnetic field of 9.5 µT was applied.
Original language | English |
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Pages (from-to) | 181-191 |
Number of pages | 11 |
Journal | ECS transactions |
Volume | 2 |
Issue number | 7 |
DOIs | |
Publication status | Published - 2006 |
Event | 209th ECS Meeting 2006 - Denver, United States Duration: 7 May 2006 → 12 May 2006 Conference number: 209 |
Keywords
- SC-ICF: Integrated Circuit Fabrication