Large area resist-free soft lithographic patterning of graphene

A. George, S. Mathew, Raoul van Gastel, Maarten Nijland, K. Gopinadhan, Peter Brinks, T. Venkatesan, Johan E. ten Elshof

Research output: Contribution to journalArticleAcademicpeer-review


Large area low-cost patterning is a challenging problem in graphene research. A resist-free, single-step, large area and cost effective soft lithographic patterning strategy is presented for graphene. The technique is applicable on any arbitrary substrate that needs to be covered with a graphene film and provides a viable route to large-area patterning of graphene for device applications.
Original languageUndefined
Pages (from-to)711-715
Number of pages5
Issue number5
Publication statusPublished - 19 Nov 2013


  • IR-89918
  • METIS-295998

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