Large area resist-free soft lithographic patterning of graphene

A. George; S. Mathew; Raoul van Gastel; Maarten Nijland; K. Gopinadhan; Peter Brinks; T. Venkatesan; Johan E. ten Elshof

doi:10.1002/smll.201201889

Large area resist-free soft lithographic patterning of graphene

A. George, S. Mathew, Raoul van Gastel, Maarten Nijland, K. Gopinadhan, Peter Brinks, T. Venkatesan, Johan E. ten Elshof

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Abstract

Large area low-cost patterning is a challenging problem in graphene research. A resist-free, single-step, large area and cost effective soft lithographic patterning strategy is presented for graphene. The technique is applicable on any arbitrary substrate that needs to be covered with a graphene film and provides a viable route to large-area patterning of graphene for device applications.

Original language	Undefined
Pages (from-to)	711-715
Number of pages	5
Journal	Small
Volume	9
Issue number	5
DOIs	https://doi.org/10.1002/smll.201201889
Publication status	Published - 19 Nov 2013

Keywords

IR-89918
METIS-295998

Access to Document

10.1002/smll.201201889

Cite this

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title = "Large area resist-free soft lithographic patterning of graphene",

abstract = "Large area low-cost patterning is a challenging problem in graphene research. A resist-free, single-step, large area and cost effective soft lithographic patterning strategy is presented for graphene. The technique is applicable on any arbitrary substrate that needs to be covered with a graphene film and provides a viable route to large-area patterning of graphene for device applications.",

keywords = "IR-89918, METIS-295998",

author = "A. George and S. Mathew and {van Gastel}, Raoul and Maarten Nijland and K. Gopinadhan and Peter Brinks and T. Venkatesan and {ten Elshof}, {Johan E.}",

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AU - George, A.

AU - Mathew, S.

AU - van Gastel, Raoul

AU - Nijland, Maarten

AU - Gopinadhan, K.

AU - Brinks, Peter

AU - Venkatesan, T.

AU - ten Elshof, Johan E.

PY - 2013/11/19

Y1 - 2013/11/19

N2 - Large area low-cost patterning is a challenging problem in graphene research. A resist-free, single-step, large area and cost effective soft lithographic patterning strategy is presented for graphene. The technique is applicable on any arbitrary substrate that needs to be covered with a graphene film and provides a viable route to large-area patterning of graphene for device applications.

AB - Large area low-cost patterning is a challenging problem in graphene research. A resist-free, single-step, large area and cost effective soft lithographic patterning strategy is presented for graphene. The technique is applicable on any arbitrary substrate that needs to be covered with a graphene film and provides a viable route to large-area patterning of graphene for device applications.

KW - IR-89918

KW - METIS-295998

U2 - 10.1002/smll.201201889

DO - 10.1002/smll.201201889

M3 - Article

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