Large Area Resist-Free Soft Lithographic Patterning of Graphene

A. George, S. Mathew, Raoul van Gastel, Maarten Nijland, K. Gopinadhan, Peter Brinks, T. Venkatesan, Johan E. ten Elshof

Research output: Contribution to conferencePoster

18 Citations (Scopus)
Original languageEnglish
Publication statusPublished - 27 Jan 2013
Event1st European Workshop on Epitaxial Graphene 2013 - Aussois, France
Duration: 27 Jan 201331 Jan 2013
Conference number: 1

Conference

Conference1st European Workshop on Epitaxial Graphene 2013
Abbreviated titleEWEG 2013
CountryFrance
CityAussois
Period27/01/1331/01/13

Keywords

  • METIS-299880

Cite this

George, A., Mathew, S., van Gastel, R., Nijland, M., Gopinadhan, K., Brinks, P., ... ten Elshof, J. E. (2013). Large Area Resist-Free Soft Lithographic Patterning of Graphene. Poster session presented at 1st European Workshop on Epitaxial Graphene 2013, Aussois, France.