Large Area Resist-Free Soft Lithographic Patterning of Graphene

Andre ten Elshof, A. George, S. Mathew, R. van Gastel, M. Nijland, K. Gopinadhan, P. Brinks, T. Venkatesan

Research output: Contribution to conference › Poster › Other research output

Original language	English
Publication status	Published - 5 Mar 2013
Event	NWO/CW Study Group Meeting 2013: Chemistry in Relation to Physics and Materials Sciences - Veldhoven, Netherlands Duration: 4 Mar 2013 → 5 Mar 2013

Cite this

@conference{6e76fe92b0a64d12b77bec5bd98bb0c2,

title = "Large Area Resist-Free Soft Lithographic Patterning of Graphene",

author = "{ten Elshof}, Andre and A. George and S. Mathew and {van Gastel}, R. and M. Nijland and K. Gopinadhan and P. Brinks and T. Venkatesan",

year = "2013",

month = mar,

day = "5",

language = "English",

note = "NWO/CW Study Group Meeting 2013 : Chemistry in Relation to Physics and Materials Sciences ; Conference date: 04-03-2013 Through 05-03-2013",

}