Large area two-dimensional silicon photonic crystals for infrared light fabricated with laser interference lithography

L.G. Prodan, T.G. Euser, H.A.G.M. van Wolferen, C.G. Bostan, R.M. de Ridder, R. Beigang, K.-J. Boller, L. Kuipers

Research output: Contribution to journalArticleAcademicpeer-review

21 Citations (Scopus)

Abstract

We report on the production of large-area 2D photonic crystals from high-index material with laser interference lithography (LIL). A new image reversal photoresist is used in combination with an anti-reflection coating to suppress undesired reflections. The photonic crystals possess a cubic pattern of air holes in a 500 nm silicon layer and cover an area of 1 cm2
Original languageEnglish
Pages (from-to)639-642
Number of pages4
JournalNanotechnology
Volume15
Issue number5
DOIs
Publication statusPublished - May 2004

Keywords

  • IOMS-PCS: PHOTONIC CRYSTAL STRUCTURES

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