Large area two-dimensional silicon photonic crystals for infrared light fabricated with laser interference lithography

L.G. Prodan; T.G. Euser; H.A.G.M. van Wolferen; C.G. Bostan; R.M. de Ridder; R. Beigang; K.-J. Boller; L. Kuipers

doi:10.1088/0957-4484/15/5/040

Large area two-dimensional silicon photonic crystals for infrared light fabricated with laser interference lithography

L.G. Prodan, T.G. Euser, H.A.G.M. van Wolferen, C.G. Bostan, R.M. de Ridder, R. Beigang, K.-J. Boller, L. Kuipers

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Abstract

We report on the production of large-area 2D photonic crystals from high-index material with laser interference lithography (LIL). A new image reversal photoresist is used in combination with an anti-reflection coating to suppress undesired reflections. The photonic crystals possess a cubic pattern of air holes in a 500 nm silicon layer and cover an area of 1 cm²

Original language	English
Pages (from-to)	639-642
Number of pages	4
Journal	Nanotechnology
Volume	15
Issue number	5
DOIs	https://doi.org/10.1088/0957-4484/15/5/040
Publication status	Published - May 2004

Keywords

IOMS-PCS: PHOTONIC CRYSTAL STRUCTURES

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10.1088/0957-4484/15/5/040

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title = "Large area two-dimensional silicon photonic crystals for infrared light fabricated with laser interference lithography",

abstract = "We report on the production of large-area 2D photonic crystals from high-index material with laser interference lithography (LIL). A new image reversal photoresist is used in combination with an anti-reflection coating to suppress undesired reflections. The photonic crystals possess a cubic pattern of air holes in a 500 nm silicon layer and cover an area of 1 cm2",

keywords = "IOMS-PCS: PHOTONIC CRYSTAL STRUCTURES",

author = "L.G. Prodan and T.G. Euser and {van Wolferen}, H.A.G.M. and C.G. Bostan and {de Ridder}, R.M. and R. Beigang and K.-J. Boller and L. Kuipers",

year = "2004",

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doi = "10.1088/0957-4484/15/5/040",

language = "English",

volume = "15",

pages = "639--642",

journal = "Nanotechnology",

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publisher = "Institute of Physics (IOP)",

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T1 - Large area two-dimensional silicon photonic crystals for infrared light fabricated with laser interference lithography

AU - Prodan, L.G.

AU - Euser, T.G.

AU - van Wolferen, H.A.G.M.

AU - Bostan, C.G.

AU - de Ridder, R.M.

AU - Beigang, R.

AU - Boller, K.-J.

AU - Kuipers, L.

PY - 2004/5

Y1 - 2004/5

N2 - We report on the production of large-area 2D photonic crystals from high-index material with laser interference lithography (LIL). A new image reversal photoresist is used in combination with an anti-reflection coating to suppress undesired reflections. The photonic crystals possess a cubic pattern of air holes in a 500 nm silicon layer and cover an area of 1 cm2

AB - We report on the production of large-area 2D photonic crystals from high-index material with laser interference lithography (LIL). A new image reversal photoresist is used in combination with an anti-reflection coating to suppress undesired reflections. The photonic crystals possess a cubic pattern of air holes in a 500 nm silicon layer and cover an area of 1 cm2

KW - IOMS-PCS: PHOTONIC CRYSTAL STRUCTURES

U2 - 10.1088/0957-4484/15/5/040

DO - 10.1088/0957-4484/15/5/040

M3 - Article

SN - 0957-4484

VL - 15

SP - 639

EP - 642

JO - Nanotechnology

JF - Nanotechnology

IS - 5

ER -

Large area two-dimensional silicon photonic crystals for infrared light fabricated with laser interference lithography

Abstract

Keywords

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