Laser-assisted microstructuring for Ti:sapphire channel-waveguide fabrication

A. Crunteanu; Markus Pollnau; G. Jänchen; C. Hibert; P. Hoffmann; R.P. Salathé; R.W. Eason; D.P. Shepherd

doi:10.1117/12.543706

Laser-assisted microstructuring for Ti:sapphire channel-waveguide fabrication

A. Crunteanu, Markus Pollnau, G. Jänchen, C. Hibert, P. Hoffmann, R.P. Salathé, R.W. Eason, D.P. Shepherd

Research output: Contribution to conference › Paper › Academic › peer-review

Abstract

We report on the fabrication of Ti:sapphire channel waveguides. Such channel waveguides are of interest, e.g., as low-threshold tunable lasers. We investigated several structuring methods including ion beam implantation followed by wet chemical etching strip loading by polyimide spin coating and subsequent laser micro-machining, direct laser ablation or reactive ion etching through laser-structured polyimide contact masks. The later two methods result in ribs having different widths and heights up to ~5 µm. By reactive ion etching we have obtained channel waveguides with strong confinement of the Ti:sapphire fluorescence emission.

Original language	Undefined
Pages	363-369
Number of pages	7
DOIs	https://doi.org/10.1117/12.543706
Publication status	Published - Nov 2003
Event	International Conference on Advanced Laser Technologies, ALT'02 - Adelboden, Switzerland Duration: 15 Sep 2002 → 20 Sep 2002

Conference

Conference	International Conference on Advanced Laser Technologies, ALT'02
Period	15/09/02 → 20/09/02
Other	15-20 September 2002

Keywords

broadband fluorescence
EWI-18202
reactive ion etching
IOMS-APD: Active Photonic Devices
Ti:sapphire
Laser ablation
IR-72461
Channel waveguide

Access to Document

10.1117/12.543706

http://eprints.eemcs.utwente.nl/secure2/18202/01/Crunteanu_ALT02_Proceedings.pdf

Cite this

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title = "Laser-assisted microstructuring for Ti:sapphire channel-waveguide fabrication",

abstract = "We report on the fabrication of Ti:sapphire channel waveguides. Such channel waveguides are of interest, e.g., as low-threshold tunable lasers. We investigated several structuring methods including ion beam implantation followed by wet chemical etching strip loading by polyimide spin coating and subsequent laser micro-machining, direct laser ablation or reactive ion etching through laser-structured polyimide contact masks. The later two methods result in ribs having different widths and heights up to ~5 µm. By reactive ion etching we have obtained channel waveguides with strong confinement of the Ti:sapphire fluorescence emission.",

keywords = "broadband fluorescence, EWI-18202, reactive ion etching, IOMS-APD: Active Photonic Devices, Ti:sapphire, Laser ablation, IR-72461, Channel waveguide",

author = "A. Crunteanu and Markus Pollnau and G. J{\"a}nchen and C. Hibert and P. Hoffmann and R.P. Salath{\'e} and R.W. Eason and D.P. Shepherd",

year = "2003",

month = nov,

doi = "10.1117/12.543706",

language = "Undefined",

pages = "363--369",

note = "null ; Conference date: 15-09-2002 Through 20-09-2002",

}

Laser-assisted microstructuring for Ti:sapphire channel-waveguide fabrication. / Crunteanu, A.; Pollnau, Markus; Jänchen, G.; Hibert, C.; Hoffmann, P.; Salathé, R.P.; Eason, R.W.; Shepherd, D.P.

2003. 363-369 Paper presented at International Conference on Advanced Laser Technologies, ALT'02, .

Research output: Contribution to conference › Paper › Academic › peer-review

TY - CONF

T1 - Laser-assisted microstructuring for Ti:sapphire channel-waveguide fabrication

AU - Crunteanu, A.

AU - Pollnau, Markus

AU - Jänchen, G.

AU - Hibert, C.

AU - Hoffmann, P.

AU - Salathé, R.P.

AU - Eason, R.W.

AU - Shepherd, D.P.

PY - 2003/11

Y1 - 2003/11

N2 - We report on the fabrication of Ti:sapphire channel waveguides. Such channel waveguides are of interest, e.g., as low-threshold tunable lasers. We investigated several structuring methods including ion beam implantation followed by wet chemical etching strip loading by polyimide spin coating and subsequent laser micro-machining, direct laser ablation or reactive ion etching through laser-structured polyimide contact masks. The later two methods result in ribs having different widths and heights up to ~5 µm. By reactive ion etching we have obtained channel waveguides with strong confinement of the Ti:sapphire fluorescence emission.

AB - We report on the fabrication of Ti:sapphire channel waveguides. Such channel waveguides are of interest, e.g., as low-threshold tunable lasers. We investigated several structuring methods including ion beam implantation followed by wet chemical etching strip loading by polyimide spin coating and subsequent laser micro-machining, direct laser ablation or reactive ion etching through laser-structured polyimide contact masks. The later two methods result in ribs having different widths and heights up to ~5 µm. By reactive ion etching we have obtained channel waveguides with strong confinement of the Ti:sapphire fluorescence emission.

KW - broadband fluorescence

KW - EWI-18202

KW - reactive ion etching

KW - IOMS-APD: Active Photonic Devices

KW - Ti:sapphire

KW - Laser ablation

KW - IR-72461

KW - Channel waveguide

U2 - 10.1117/12.543706

DO - 10.1117/12.543706

M3 - Paper

SP - 363

EP - 369

Y2 - 15 September 2002 through 20 September 2002

ER -