Abstract
We report on the fabrication of Ti:sapphire channel waveguides. Such channel waveguides are of interest, e.g., as low-threshold tunable lasers. We investigated several structuring methods including ion beam implantation followed by wet chemical etching strip loading by polyimide spin coating and subsequent laser micro-machining, direct laser ablation or reactive ion etching through laser-structured polyimide contact masks. The later two methods result in ribs having different widths and heights up to ~5 µm. By reactive ion etching we have obtained channel waveguides with strong confinement of the Ti:sapphire fluorescence emission.
Original language | Undefined |
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Pages | 363-369 |
Number of pages | 7 |
DOIs | |
Publication status | Published - Nov 2003 |
Event | International Conference on Advanced Laser Technologies, ALT'02 - Adelboden, Switzerland Duration: 15 Sep 2002 → 20 Sep 2002 |
Conference
Conference | International Conference on Advanced Laser Technologies, ALT'02 |
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Period | 15/09/02 → 20/09/02 |
Other | 15-20 September 2002 |
Keywords
- broadband fluorescence
- EWI-18202
- reactive ion etching
- IOMS-APD: Active Photonic Devices
- Ti:sapphire
- Laser ablation
- IR-72461
- Channel waveguide