Laser-assisted microstructuring for Ti:sapphire channel-waveguide fabrication

A. Crunteanu, Markus Pollnau, G. Jänchen, C. Hibert, P. Hoffmann, R.P. Salathé, R.W. Eason, D.P. Shepherd

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    We report on the fabrication of Ti:sapphire channel waveguides. Such channel waveguides are of interest, e.g., as low-threshold tunable lasers. We investigated several structuring methods including ion beam implantation followed by wet chemical etching strip loading by polyimide spin coating and subsequent laser micro-machining, direct laser ablation or reactive ion etching through laser-structured polyimide contact masks. The later two methods result in ribs having different widths and heights up to ~5 µm. By reactive ion etching we have obtained channel waveguides with strong confinement of the Ti:sapphire fluorescence emission.
    Original languageUndefined
    Number of pages7
    Publication statusPublished - Nov 2003
    EventInternational Conference on Advanced Laser Technologies, ALT'02 - Adelboden, Switzerland
    Duration: 15 Sept 200220 Sept 2002


    ConferenceInternational Conference on Advanced Laser Technologies, ALT'02
    Other15-20 September 2002


    • broadband fluorescence
    • EWI-18202
    • reactive ion etching
    • IOMS-APD: Active Photonic Devices
    • Ti:sapphire
    • Laser ablation
    • IR-72461
    • Channel waveguide

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