TY - JOUR
T1 - Laser gain measurements at 193 nm in a small discharge cell containing ArF excimer laser gas mixtures
AU - Azarov, A.V.
AU - Peters, P.J.M.
AU - Boller, K.-J.
PY - 2008
Y1 - 2008
N2 - Spatial and temporal gain profiles as well as the peak net gain at 193 nm have been measured in X-ray preionized discharges excited by a single pulse electrical system working in the charge transfer mode. Ar- and F2-containing laser gas mixtures with He or Ne as a buffer gas have been used. With a pumping pulse duration of ~ 100 ns (FWHM) and a specific peak power deposition of ~ 1 MW cm-3 bar-1 in a gas mixture containing F2 : Ar : He (0.1%:5%:94.9%), at 2 bar total pressure, a very high peak net gain coefficient of ~30% cm-1 was measured in the gas discharge. The FWHM of the gain waveform was ~ 60 ns
AB - Spatial and temporal gain profiles as well as the peak net gain at 193 nm have been measured in X-ray preionized discharges excited by a single pulse electrical system working in the charge transfer mode. Ar- and F2-containing laser gas mixtures with He or Ne as a buffer gas have been used. With a pumping pulse duration of ~ 100 ns (FWHM) and a specific peak power deposition of ~ 1 MW cm-3 bar-1 in a gas mixture containing F2 : Ar : He (0.1%:5%:94.9%), at 2 bar total pressure, a very high peak net gain coefficient of ~30% cm-1 was measured in the gas discharge. The FWHM of the gain waveform was ~ 60 ns
U2 - 10.1007/s00340-007-2854-9
DO - 10.1007/s00340-007-2854-9
M3 - Article
SN - 0946-2171
VL - B 90
SP - 455
EP - 460
JO - Applied physics B: Lasers and optics
JF - Applied physics B: Lasers and optics
IS - 3-4
ER -