Laser impact on a drop

Alexander Ludwig Klein; C.W. Visser; W. Bouwhuis; H.E. Lhuissier; Jacobus Hendrikus Snoeijer; E. Villermaux; Detlef Lohse; Hanneke Gelderblom

Laser impact on a drop

Alexander Ludwig Klein, C.W. Visser, W. Bouwhuis, H.E. Lhuissier, Jacobus Hendrikus Snoeijer, E. Villermaux, Detlef Lohse, Hanneke Gelderblom

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Abstract

The energy deposition in a liquid drop on a nanosecond time scale by impact of a laser pulse can induce various reactions, such as vaporization or plasma generation. The response of the drop can be extremely violent: The drop gets strongly deformed and propelled forward at several m/s, and subsequently breaks up or even explodes. These effects are used in a controlled manner during the generation of extreme ultraviolet (EUV) light in nanolithography machines for the fabrication of leading-edge semiconductor microchips. Detailed understanding of the fundamentals of this process is of key importance in order to advance the latest lithography machines. - See more at: http://gfm.aps.org/meetings/dfd-2014/5408ec6e69702d07711b0200#sthash.26qTrDD5.dpuf

Original language	English
Publisher	American Physical Society
Publication status	Published - 2014
Event	67th Annual Meeting of the APS Division of Fluid Dynamics, APS-DFD 2014 - San Francisco, United States Duration: 23 Nov 2014 → 25 Nov 2014 Conference number: 67

Keywords

IR-95082
METIS-308404

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title = "Laser impact on a drop",

abstract = "The energy deposition in a liquid drop on a nanosecond time scale by impact of a laser pulse can induce various reactions, such as vaporization or plasma generation. The response of the drop can be extremely violent: The drop gets strongly deformed and propelled forward at several m/s, and subsequently breaks up or even explodes. These effects are used in a controlled manner during the generation of extreme ultraviolet (EUV) light in nanolithography machines for the fabrication of leading-edge semiconductor microchips. Detailed understanding of the fundamentals of this process is of key importance in order to advance the latest lithography machines. - See more at: http://gfm.aps.org/meetings/dfd-2014/5408ec6e69702d07711b0200#sthash.26qTrDD5.dpuf",

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author = "Klein, {Alexander Ludwig} and C.W. Visser and W. Bouwhuis and H.E. Lhuissier and Snoeijer, {Jacobus Hendrikus} and E. Villermaux and Detlef Lohse and Hanneke Gelderblom",

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publisher = "American Physical Society",

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T1 - Laser impact on a drop

AU - Klein, Alexander Ludwig

AU - Visser, C.W.

AU - Bouwhuis, W.

AU - Lhuissier, H.E.

AU - Snoeijer, Jacobus Hendrikus

AU - Villermaux, E.

AU - Lohse, Detlef

AU - Gelderblom, Hanneke

N1 - Conference code: 67

PY - 2014

Y1 - 2014

N2 - The energy deposition in a liquid drop on a nanosecond time scale by impact of a laser pulse can induce various reactions, such as vaporization or plasma generation. The response of the drop can be extremely violent: The drop gets strongly deformed and propelled forward at several m/s, and subsequently breaks up or even explodes. These effects are used in a controlled manner during the generation of extreme ultraviolet (EUV) light in nanolithography machines for the fabrication of leading-edge semiconductor microchips. Detailed understanding of the fundamentals of this process is of key importance in order to advance the latest lithography machines. - See more at: http://gfm.aps.org/meetings/dfd-2014/5408ec6e69702d07711b0200#sthash.26qTrDD5.dpuf

AB - The energy deposition in a liquid drop on a nanosecond time scale by impact of a laser pulse can induce various reactions, such as vaporization or plasma generation. The response of the drop can be extremely violent: The drop gets strongly deformed and propelled forward at several m/s, and subsequently breaks up or even explodes. These effects are used in a controlled manner during the generation of extreme ultraviolet (EUV) light in nanolithography machines for the fabrication of leading-edge semiconductor microchips. Detailed understanding of the fundamentals of this process is of key importance in order to advance the latest lithography machines. - See more at: http://gfm.aps.org/meetings/dfd-2014/5408ec6e69702d07711b0200#sthash.26qTrDD5.dpuf

KW - IR-95082

KW - METIS-308404

M3 - Digital or Visual Products

PB - American Physical Society

T2 - 67th Annual Meeting of the APS Division of Fluid Dynamics, APS-DFD 2014

Y2 - 23 November 2014 through 25 November 2014

ER -

Laser impact on a drop

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Keywords

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