Laser-induced forward transfer of intact chalcogenide thin films: resultant morphology and thermoelectric properties

Matthias Feinaeugle, C.L. Sones, E. Koukharenko, B. Gholipour, D.W. Hewak, R.W. Eason

    Research output: Contribution to journalArticleAcademicpeer-review

    16 Citations (Scopus)

    Abstract

    We present a laser-based transfer method for the novel application of fabricating elements for planar thermoelectric devices. Thin films of thermoelectric chalcogenides (Bi2Te3, Bi2Se3 and Bi0.5Sb1.5Te3) were printed via laser-induced forward transfer (LIFT) onto polymer-coated substrates over large areas of up to ∼15 mm2 in size. A morphological study showed that it was possible to partially preserve the polycrystalline structure of the transferred films. The films’ Seebeck coefficients after LIFT transfer were measured and resulted in −49±1 μV/K, −93±8 μV/K and 142±3 μV/K for Bi2Te3, Bi2Se3 and Bi0.5Sb1.5Te3, respectively, which were found to be ∼23±6 % lower compared to their initial values. This demonstration shows that LIFT is suitable to transfer sensitive, functional semiconductor materials over areas up to ∼15 mm2 with minimal damage onto a non-standard polymer-coated substrate.
    Original languageEnglish
    Pages (from-to)1073-1079
    Number of pages7
    JournalApplied physics A: Materials science and processing
    Volume112
    Issue number4
    DOIs
    Publication statusPublished - 14 Dec 2012

    Keywords

    • Bismuth
    • Thermoelectric material
    • Bi2Te3
    • Seebeck coefficient
    • Thermoelectricity

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