Laser-induced forward transfer of intact chalcogenide thin films: resultant morphology and thermoelectric properties

Matthias Feinaeugle, C.L. Sones, E. Koukharenko, B. Gholipour, D.W. Hewak, R.W. Eason

Research output: Contribution to journalArticleAcademicpeer-review

21 Citations (Scopus)
7 Downloads (Pure)

Abstract

We present a laser-based transfer method for the novel application of fabricating elements for planar thermoelectric devices. Thin films of thermoelectric chalcogenides (Bi2Te3, Bi2Se3 and Bi0.5Sb1.5Te3) were printed via laser-induced forward transfer (LIFT) onto polymer-coated substrates over large areas of up to ∼15 mm2 in size. A morphological study showed that it was possible to partially preserve the polycrystalline structure of the transferred films. The films’ Seebeck coefficients after LIFT transfer were measured and resulted in −49±1 μV/K, −93±8 μV/K and 142±3 μV/K for Bi2Te3, Bi2Se3 and Bi0.5Sb1.5Te3, respectively, which were found to be ∼23±6 % lower compared to their initial values. This demonstration shows that LIFT is suitable to transfer sensitive, functional semiconductor materials over areas up to ∼15 mm2 with minimal damage onto a non-standard polymer-coated substrate.
Original languageEnglish
Pages (from-to)1073-1079
Number of pages7
JournalApplied physics A: Materials science and processing
Volume112
Issue number4
DOIs
Publication statusPublished - 14 Dec 2012
Externally publishedYes

Keywords

  • Bismuth
  • Thermoelectric material
  • Bi2Te3
  • Seebeck coefficient
  • Thermoelectricity
  • n/a OA procedure

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