Laser interference lithography with highly accurate interferometric alignment

Frank J. van Soest, Hendricus A.G.M. van Wolferen, Hugo Hoekstra, R.M. de Ridder, Kerstin Worhoff, Paul Lambeck

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    Abstract

    It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 angular and a few nanometers lateral resolution have been demonstrated.
    Original languageUndefined
    Article number10.1143/JJAP.44.6568
    Pages (from-to)6568-6570
    Number of pages3
    JournalJapanese journal of applied physics
    Volume44
    Issue number9A
    DOIs
    Publication statusPublished - Sep 2005

    Keywords

    • METIS-227926
    • EWI-1915
    • IR-65579

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