Laser interference lithography with highly accurate interferometric alignment

Frank J. van Soest, Hendricus A.G.M. van Wolferen, Hugo Hoekstra, R.M. de Ridder, Kerstin Worhoff, Paul Lambeck

Research output: Contribution to journalArticleAcademicpeer-review

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Abstract

It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 angular and a few nanometers lateral resolution have been demonstrated.
Original languageUndefined
Article number10.1143/JJAP.44.6568
Pages (from-to)6568-6570
Number of pages3
JournalJapanese journal of applied physics
Volume44
Issue number9A
DOIs
Publication statusPublished - Sep 2005

Keywords

  • METIS-227926
  • EWI-1915
  • IR-65579

Cite this

van Soest, F. J., van Wolferen, H. A. G. M., Hoekstra, H., de Ridder, R. M., Worhoff, K., & Lambeck, P. (2005). Laser interference lithography with highly accurate interferometric alignment. Japanese journal of applied physics, 44(9A), 6568-6570. [10.1143/JJAP.44.6568]. https://doi.org/10.1143/JJAP.44.6568
van Soest, Frank J. ; van Wolferen, Hendricus A.G.M. ; Hoekstra, Hugo ; de Ridder, R.M. ; Worhoff, Kerstin ; Lambeck, Paul. / Laser interference lithography with highly accurate interferometric alignment. In: Japanese journal of applied physics. 2005 ; Vol. 44, No. 9A. pp. 6568-6570.
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author = "{van Soest}, {Frank J.} and {van Wolferen}, {Hendricus A.G.M.} and Hugo Hoekstra and {de Ridder}, R.M. and Kerstin Worhoff and Paul Lambeck",
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van Soest, FJ, van Wolferen, HAGM, Hoekstra, H, de Ridder, RM, Worhoff, K & Lambeck, P 2005, 'Laser interference lithography with highly accurate interferometric alignment' Japanese journal of applied physics, vol. 44, no. 9A, 10.1143/JJAP.44.6568, pp. 6568-6570. https://doi.org/10.1143/JJAP.44.6568

Laser interference lithography with highly accurate interferometric alignment. / van Soest, Frank J.; van Wolferen, Hendricus A.G.M.; Hoekstra, Hugo; de Ridder, R.M.; Worhoff, Kerstin; Lambeck, Paul.

In: Japanese journal of applied physics, Vol. 44, No. 9A, 10.1143/JJAP.44.6568, 09.2005, p. 6568-6570.

Research output: Contribution to journalArticleAcademicpeer-review

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T1 - Laser interference lithography with highly accurate interferometric alignment

AU - van Soest, Frank J.

AU - van Wolferen, Hendricus A.G.M.

AU - Hoekstra, Hugo

AU - de Ridder, R.M.

AU - Worhoff, Kerstin

AU - Lambeck, Paul

PY - 2005/9

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AB - It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 angular and a few nanometers lateral resolution have been demonstrated.

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KW - EWI-1915

KW - IR-65579

U2 - 10.1143/JJAP.44.6568

DO - 10.1143/JJAP.44.6568

M3 - Article

VL - 44

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EP - 6570

JO - Japanese journal of applied physics

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van Soest FJ, van Wolferen HAGM, Hoekstra H, de Ridder RM, Worhoff K, Lambeck P. Laser interference lithography with highly accurate interferometric alignment. Japanese journal of applied physics. 2005 Sep;44(9A):6568-6570. 10.1143/JJAP.44.6568. https://doi.org/10.1143/JJAP.44.6568