Laser interference lithography with highly accurate interferometric alignment

Frank J. van Soest; Hendricus A.G.M. van Wolferen; Hugo Hoekstra; R.M. de Ridder; Kerstin Worhoff; Paul Lambeck

Laser interference lithography with highly accurate interferometric alignment

Frank J. van Soest, Hendricus A.G.M. van Wolferen, Hugo Hoekstra, R.M. de Ridder, Kerstin Worhoff, Paul Lambeck

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

16 Citations (Scopus)

136 Downloads (Pure)

Abstract

It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 degree angular and a few nanometers lateral resolution have been demonstrated.

Original language	Undefined
Title of host publication	Twelfth European Conference on Integrated Optics, ECIO'05
Place of Publication	Grenoble, France
Publisher	Minatec
Pages	570-573
Number of pages	4
ISBN (Print)	not assigned
Publication status	Published - Apr 2005
Event	12th European Conference on Integrated Optics, ECIO 2005 - Congress Center WTC Grenoble, Grenoble, France Duration: 6 Apr 2005 → 8 Apr 2005 Conference number: 12

Publication series

Name
Publisher	Minatec

Conference

Conference	12th European Conference on Integrated Optics, ECIO 2005
Abbreviated title	ECIO
Country/Territory	France
City	Grenoble
Period	6/04/05 → 8/04/05

Keywords

IR-65578
METIS-228311
EWI-1914

Access to Document

Cite this

@inproceedings{074235fc6d3d4a9081518767926a7622,

title = "Laser interference lithography with highly accurate interferometric alignment",

abstract = "It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 degree angular and a few nanometers lateral resolution have been demonstrated.",

keywords = "IR-65578, METIS-228311, EWI-1914",

author = "{van Soest}, {Frank J.} and {van Wolferen}, {Hendricus A.G.M.} and Hugo Hoekstra and {de Ridder}, R.M. and Kerstin Worhoff and Paul Lambeck",

note = "Paper ThPo49 (abstract) ; 12th European Conference on Integrated Optics, ECIO 2005 ; Conference date: 06-04-2005 Through 08-04-2005",

year = "2005",

month = apr,

language = "Undefined",

isbn = "not assigned",

publisher = "Minatec",

pages = "570--573",

booktitle = "Twelfth European Conference on Integrated Optics, ECIO'05",

}

Laser interference lithography with highly accurate interferometric alignment. / van Soest, Frank J.; van Wolferen, Hendricus A.G.M.; Hoekstra, Hugo et al.
Twelfth European Conference on Integrated Optics, ECIO'05. Grenoble, France: Minatec, 2005. p. 570-573.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Laser interference lithography with highly accurate interferometric alignment

AU - van Soest, Frank J.

AU - van Wolferen, Hendricus A.G.M.

AU - Hoekstra, Hugo

AU - de Ridder, R.M.

AU - Worhoff, Kerstin

AU - Lambeck, Paul

N1 - Conference code: 12

PY - 2005/4

Y1 - 2005/4

N2 - It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 degree angular and a few nanometers lateral resolution have been demonstrated.

AB - It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 degree angular and a few nanometers lateral resolution have been demonstrated.

KW - IR-65578

KW - METIS-228311

KW - EWI-1914

M3 - Conference contribution

SN - not assigned

SP - 570

EP - 573

BT - Twelfth European Conference on Integrated Optics, ECIO'05

PB - Minatec

CY - Grenoble, France

T2 - 12th European Conference on Integrated Optics, ECIO 2005

Y2 - 6 April 2005 through 8 April 2005

ER -