Laser interference lithography with highly accurate interferometric alignment

Frank J. van Soest, Hendricus A.G.M. van Wolferen, Hugo Hoekstra, R.M. de Ridder, Kerstin Worhoff, Paul Lambeck

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    15 Citations (Scopus)
    66 Downloads (Pure)

    Abstract

    It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 degree angular and a few nanometers lateral resolution have been demonstrated.
    Original languageUndefined
    Title of host publicationTwelfth European Conference on Integrated Optics, ECIO'05
    Place of PublicationGrenoble, France
    PublisherMinatec
    Pages570-573
    Number of pages4
    ISBN (Print)not assigned
    Publication statusPublished - Apr 2005
    Event12th European Conference on Integrated Optics, ECIO 2005 - Congress Center WTC Grenoble, Grenoble, France
    Duration: 6 Apr 20058 Apr 2005
    Conference number: 12

    Publication series

    Name
    PublisherMinatec

    Conference

    Conference12th European Conference on Integrated Optics, ECIO 2005
    Abbreviated titleECIO
    CountryFrance
    CityGrenoble
    Period6/04/058/04/05

    Keywords

    • IR-65578
    • METIS-228311
    • EWI-1914

    Cite this

    van Soest, F. J., van Wolferen, H. A. G. M., Hoekstra, H., de Ridder, R. M., Worhoff, K., & Lambeck, P. (2005). Laser interference lithography with highly accurate interferometric alignment. In Twelfth European Conference on Integrated Optics, ECIO'05 (pp. 570-573). Grenoble, France: Minatec.