Laser interference lithography with highly accurate interferometric alignment

Frank J. van Soest, Hendricus A.G.M. van Wolferen, Hugo Hoekstra, R.M. de Ridder, Kerstin Worhoff, Paul Lambeck

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

15 Citations (Scopus)
49 Downloads (Pure)

Abstract

It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 degree angular and a few nanometers lateral resolution have been demonstrated.
Original languageUndefined
Title of host publicationTwelfth European Conference on Integrated Optics, ECIO'05
Place of PublicationGrenoble, France
PublisherMinatec
Pages570-573
Number of pages4
ISBN (Print)not assigned
Publication statusPublished - Apr 2005
Event12th European Conference on Integrated Optics, ECIO 2005 - Congress Center WTC Grenoble, Grenoble, France
Duration: 6 Apr 20058 Apr 2005
Conference number: 12

Publication series

Name
PublisherMinatec

Conference

Conference12th European Conference on Integrated Optics, ECIO 2005
Abbreviated titleECIO
CountryFrance
CityGrenoble
Period6/04/058/04/05

Keywords

  • IR-65578
  • METIS-228311
  • EWI-1914

Cite this

van Soest, F. J., van Wolferen, H. A. G. M., Hoekstra, H., de Ridder, R. M., Worhoff, K., & Lambeck, P. (2005). Laser interference lithography with highly accurate interferometric alignment. In Twelfth European Conference on Integrated Optics, ECIO'05 (pp. 570-573). Grenoble, France: Minatec.
van Soest, Frank J. ; van Wolferen, Hendricus A.G.M. ; Hoekstra, Hugo ; de Ridder, R.M. ; Worhoff, Kerstin ; Lambeck, Paul. / Laser interference lithography with highly accurate interferometric alignment. Twelfth European Conference on Integrated Optics, ECIO'05. Grenoble, France : Minatec, 2005. pp. 570-573
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title = "Laser interference lithography with highly accurate interferometric alignment",
abstract = "It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 degree angular and a few nanometers lateral resolution have been demonstrated.",
keywords = "IR-65578, METIS-228311, EWI-1914",
author = "{van Soest}, {Frank J.} and {van Wolferen}, {Hendricus A.G.M.} and Hugo Hoekstra and {de Ridder}, R.M. and Kerstin Worhoff and Paul Lambeck",
note = "Paper ThPo49 (abstract)",
year = "2005",
month = "4",
language = "Undefined",
isbn = "not assigned",
publisher = "Minatec",
pages = "570--573",
booktitle = "Twelfth European Conference on Integrated Optics, ECIO'05",

}

van Soest, FJ, van Wolferen, HAGM, Hoekstra, H, de Ridder, RM, Worhoff, K & Lambeck, P 2005, Laser interference lithography with highly accurate interferometric alignment. in Twelfth European Conference on Integrated Optics, ECIO'05. Minatec, Grenoble, France, pp. 570-573, 12th European Conference on Integrated Optics, ECIO 2005, Grenoble, France, 6/04/05.

Laser interference lithography with highly accurate interferometric alignment. / van Soest, Frank J.; van Wolferen, Hendricus A.G.M.; Hoekstra, Hugo; de Ridder, R.M.; Worhoff, Kerstin; Lambeck, Paul.

Twelfth European Conference on Integrated Optics, ECIO'05. Grenoble, France : Minatec, 2005. p. 570-573.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

TY - GEN

T1 - Laser interference lithography with highly accurate interferometric alignment

AU - van Soest, Frank J.

AU - van Wolferen, Hendricus A.G.M.

AU - Hoekstra, Hugo

AU - de Ridder, R.M.

AU - Worhoff, Kerstin

AU - Lambeck, Paul

N1 - Paper ThPo49 (abstract)

PY - 2005/4

Y1 - 2005/4

N2 - It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 degree angular and a few nanometers lateral resolution have been demonstrated.

AB - It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 degree angular and a few nanometers lateral resolution have been demonstrated.

KW - IR-65578

KW - METIS-228311

KW - EWI-1914

M3 - Conference contribution

SN - not assigned

SP - 570

EP - 573

BT - Twelfth European Conference on Integrated Optics, ECIO'05

PB - Minatec

CY - Grenoble, France

ER -

van Soest FJ, van Wolferen HAGM, Hoekstra H, de Ridder RM, Worhoff K, Lambeck P. Laser interference lithography with highly accurate interferometric alignment. In Twelfth European Conference on Integrated Optics, ECIO'05. Grenoble, France: Minatec. 2005. p. 570-573