Laser interference lithography with highly accurate interferometric alignment

Frank J. van Soest, Hendricus A.G.M. van Wolferen, Hugo Hoekstra, Kerstin Worhoff, Paul Lambeck

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    Abstract

    Three dimensional photonic crystals, e.g. for obtaining the so-called woodpile structure, can, among others, be fabricated by vertical stacking of multiple gratings. One of the requirements for obtaining a full photonic bandgap in such a photonic crystal is an accurate angular and lateral alignment of the successive gratings. Using laser interference lithography at 266 nm wavelength, we fabricated gratings in silicon with periods down to 300 nm. We present a method for aligning further grating exposures with respect to this grating with a 0.001 degree angular and a few nanometers lateral resolution.
    Original languageUndefined
    Title of host publicationProceedings 8th Annual Symposium IEEE LEOS Benelux Chapter
    EditorsR.M. de Ridder, R.M de Ridder, G. Altena, G Altena, D.H. Geuzebroek, R. Dekker, R Dekker
    Place of PublicationEnschede
    PublisherVrije Universiteit Amsterdam
    Pages269-272
    Number of pages4
    ISBN (Print)90-365-1990-X
    Publication statusPublished - 20 Nov 2003
    Event8th Annual Symposium IEEE/LEOS Benelux Chapter 2003 - University of Twente, Enschede, Netherlands
    Duration: 20 Nov 200321 Nov 2003
    Conference number: 8

    Publication series

    Name
    PublisherVrije Universiteit Amsterdam

    Conference

    Conference8th Annual Symposium IEEE/LEOS Benelux Chapter 2003
    CountryNetherlands
    CityEnschede
    Period20/11/0321/11/03

    Keywords

    • IR-58171
    • METIS-214810

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