Abstract
Three dimensional photonic crystals, e.g. for obtaining the so-called woodpile structure, can, among others, be fabricated by vertical stacking of multiple gratings. One of the requirements for obtaining a full photonic bandgap in such a photonic crystal is an accurate angular and lateral alignment of the successive gratings. Using laser interference lithography at 266 nm wavelength, we fabricated gratings in silicon with periods down to 300 nm. We present a method for aligning further grating exposures with respect to this grating with a 0.001 degree angular and a few nanometers lateral resolution.
Original language | Undefined |
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Title of host publication | Proceedings 8th Annual Symposium IEEE LEOS Benelux Chapter |
Editors | R.M. de Ridder, R.M de Ridder, G. Altena, G Altena, D.H. Geuzebroek, R. Dekker, R Dekker |
Place of Publication | Enschede |
Publisher | Vrije Universiteit |
Pages | 269-272 |
Number of pages | 4 |
ISBN (Print) | 90-365-1990-X |
Publication status | Published - 20 Nov 2003 |
Event | 8th Annual Symposium IEEE/LEOS Benelux Chapter 2003 - University of Twente, Enschede, Netherlands Duration: 20 Nov 2003 → 21 Nov 2003 Conference number: 8 |
Publication series
Name | |
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Publisher | Vrije Universiteit Amsterdam |
Conference
Conference | 8th Annual Symposium IEEE/LEOS Benelux Chapter 2003 |
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Country/Territory | Netherlands |
City | Enschede |
Period | 20/11/03 → 21/11/03 |
Keywords
- IR-58171
- METIS-214810