Laser interference lithography with highly accurate interferometric alignment

Frank J. van Soest; Hendricus A.G.M. van Wolferen; Hugo Hoekstra; R.M. de Ridder; Kerstin Worhoff; Paul Lambeck

doi:10.1143/JJAP.44.6568

Laser interference lithography with highly accurate interferometric alignment

Frank J. van Soest
, Hendricus A.G.M. van Wolferen
, Hugo Hoekstra
, R.M. de Ridder
, Kerstin Worhoff
, Paul Lambeck

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 angular and a few nanometers lateral resolution have been demonstrated.

Original language	Undefined
Article number	10.1143/JJAP.44.6568
Pages (from-to)	6568-6570
Number of pages	3
Journal	Japanese journal of applied physics
Volume	44
Issue number	9A
DOIs	https://doi.org/10.1143/JJAP.44.6568
Publication status	Published - Sept 2005

Keywords

METIS-227926
EWI-1915
IR-65579

Access to Document

10.1143/JJAP.44.6568

Soest2005

Cite this

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title = "Laser interference lithography with highly accurate interferometric alignment",

abstract = "It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 angular and a few nanometers lateral resolution have been demonstrated.",

keywords = "METIS-227926, EWI-1915, IR-65579",

author = "\{van Soest\}, \{Frank J.\} and \{van Wolferen\}, \{Hendricus A.G.M.\} and Hugo Hoekstra and \{de Ridder\}, R.M. and Kerstin Worhoff and Paul Lambeck",

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AU - van Soest, Frank J.

AU - van Wolferen, Hendricus A.G.M.

AU - Hoekstra, Hugo

AU - de Ridder, R.M.

AU - Worhoff, Kerstin

AU - Lambeck, Paul

PY - 2005/9

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AB - It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 angular and a few nanometers lateral resolution have been demonstrated.

KW - METIS-227926

KW - EWI-1915

KW - IR-65579

U2 - 10.1143/JJAP.44.6568

DO - 10.1143/JJAP.44.6568

M3 - Article

SN - 0021-4922

VL - 44

SP - 6568

EP - 6570

JO - Japanese journal of applied physics

JF - Japanese journal of applied physics

IS - 9A

M1 - 10.1143/JJAP.44.6568

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