Abstract
A new method is proposed for hybrid integration of SiON optical waveguides and standard CMOS photo-detectors based on anisotropic etching of 45° facets in a Si substrate. After removal of anisotropically etched Si structures in cladding SiO2, the fabricated total-internal-reflection mirrors can direct the output of the waveguides to photo-detectors placed on top of the chip. The metal-free fabrication process, designed to create these mirrors, is convenient for batch production. Fourier optics based simulations predict that the reflection efficiency of the mirrors is 68.5 %. The far field pattern obtained from the fabricated device is similar to the simulated one.
Original language | English |
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Title of host publication | Proceedings of the 2011 Annual Symposium of the IEEE Photonics Benelux Chapter |
Place of Publication | Ghent, Belgium |
Publisher | Ghent University |
Pages | 105-108 |
Number of pages | 4 |
ISBN (Print) | 978-90-76546-00-1 |
Publication status | Published - 1 Dec 2011 |
Event | 16th Annual Symposium of the IEEE Photonics Benelux Chapter 2011 - Ghent, Belgium Duration: 1 Dec 2011 → 2 Dec 2011 Conference number: 16 http://www.photonics-benelux.org/symp11/ |
Publication series
Name | |
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Publisher | Department of Information Technology, Ghent University |
Conference
Conference | 16th Annual Symposium of the IEEE Photonics Benelux Chapter 2011 |
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Country/Territory | Belgium |
City | Ghent |
Period | 1/12/11 → 2/12/11 |
Internet address |
Keywords
- METIS-285009
- EWI-21293
- IR-79372