Liquid-borne nano particles impact on the random yield during critical processes in IC’s production

F. Wali; D. Martin Knotter; F.G. Kuper

Liquid-borne nano particles impact on the random yield during critical processes in IC’s production

F. Wali, D. Martin Knotter, F.G. Kuper

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Abstract

Semiconductor industry faces a continuous challenge to decrease the transistor size as well as to increase the yield by eliminating defect sources. One of the sources of particle defects is ultra pure water used in different production tools at different stages of processing. In this paper, particle count data measured in ultra pure water is related to the yield of two large size products. An impact of nano-particle present in ultra pure water on yield of up to 4-6% has been found in two different products.

Original language	Undefined
Title of host publication	Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008)
Place of Publication	Utrecht, The Netherlands
Publisher	STW
Pages	513-515
Number of pages	3
ISBN (Print)	978-90-73461-56-7
Publication status	Published - 27 Nov 2008
Event	11th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2008 - Veldhoven, Netherlands Duration: 27 Nov 2008 → 28 Nov 2008 Conference number: 11

Publication series

Name
Publisher	Technology Foundation STW
Number	WoTUG-31

Workshop

Workshop	11th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2008
Abbreviated title	SAFE
Country/Territory	Netherlands
City	Veldhoven
Period	27/11/08 → 28/11/08

Keywords

SC-ICRY: Integrated Circuit Reliability and Yield
METIS-255007
IR-62615
EWI-14618

Access to Document

http://eprints.eemcs.utwente.nl/secure2/14618/01/wali.pdf

Cite this

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title = "Liquid-borne nano particles impact on the random yield during critical processes in IC{\textquoteright}s production",

abstract = "Semiconductor industry faces a continuous challenge to decrease the transistor size as well as to increase the yield by eliminating defect sources. One of the sources of particle defects is ultra pure water used in different production tools at different stages of processing. In this paper, particle count data measured in ultra pure water is related to the yield of two large size products. An impact of nano-particle present in ultra pure water on yield of up to 4-6% has been found in two different products.",

keywords = "SC-ICRY: Integrated Circuit Reliability and Yield, METIS-255007, IR-62615, EWI-14618",

author = "F. Wali and Knotter, {D. Martin} and F.G. Kuper",

year = "2008",

month = nov,

day = "27",

language = "Undefined",

isbn = "978-90-73461-56-7",

publisher = "STW",

number = "WoTUG-31",

pages = "513--515",

booktitle = "Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008)",

note = "11th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2008 ; Conference date: 27-11-2008 Through 28-11-2008",

}

Wali, F, Knotter, DM & Kuper, FG 2008, Liquid-borne nano particles impact on the random yield during critical processes in IC’s production. in Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008). STW, Utrecht, The Netherlands, pp. 513-515, 11th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2008, Veldhoven, Netherlands, 27/11/08. <http://eprints.eemcs.utwente.nl/secure2/14618/01/wali.pdf>

Liquid-borne nano particles impact on the random yield during critical processes in IC’s production. / Wali, F.; Knotter, D. Martin; Kuper, F.G.
Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008). Utrecht, The Netherlands: STW, 2008. p. 513-515.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Liquid-borne nano particles impact on the random yield during critical processes in IC’s production

AU - Wali, F.

AU - Knotter, D. Martin

AU - Kuper, F.G.

N1 - Conference code: 11

PY - 2008/11/27

Y1 - 2008/11/27

N2 - Semiconductor industry faces a continuous challenge to decrease the transistor size as well as to increase the yield by eliminating defect sources. One of the sources of particle defects is ultra pure water used in different production tools at different stages of processing. In this paper, particle count data measured in ultra pure water is related to the yield of two large size products. An impact of nano-particle present in ultra pure water on yield of up to 4-6% has been found in two different products.

AB - Semiconductor industry faces a continuous challenge to decrease the transistor size as well as to increase the yield by eliminating defect sources. One of the sources of particle defects is ultra pure water used in different production tools at different stages of processing. In this paper, particle count data measured in ultra pure water is related to the yield of two large size products. An impact of nano-particle present in ultra pure water on yield of up to 4-6% has been found in two different products.

KW - SC-ICRY: Integrated Circuit Reliability and Yield

KW - METIS-255007

KW - IR-62615

KW - EWI-14618

M3 - Conference contribution

SN - 978-90-73461-56-7

SP - 513

EP - 515

BT - Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008)

PB - STW

CY - Utrecht, The Netherlands

T2 - 11th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2008

Y2 - 27 November 2008 through 28 November 2008

ER -