Lithography for now and the future

M. A. van de Kerkhof, J. P. H. Benschop, V. Y. Banine

Research output: Contribution to journalArticleAcademicpeer-review

1 Citation (Scopus)

Abstract

Highlights
Amount of transistors on chip oubles every 1.5–2 years accordig to Moore’s law.

Multiple patterning is required to obtain ∼10–16 nm half-pitch using immersion lithography.

EUV scanners will extend Moore’s Law for the foreseeable future.

View of further extension of EUV in the future will be discussed in this article.
Original languageEnglish
Pages (from-to)20-26
JournalSolid-state electronics
Volume155
Early online date4 Mar 2019
DOIs
Publication statusPublished - May 2019

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