Loss of selectivity during W chemical vapor deposition on Si using the WF6/SiH4 process

P.A.C. Groenen, O.F. Tekcan, J.G.A. Hoelscher, H.H. Brongersma

    Research output: Contribution to journalArticleAcademicpeer-review

    Original languageUndefined
    Pages (from-to)737-737
    JournalJournal of vacuum science and technology A: vacuum, surfaces, and films
    Issue number12
    Publication statusPublished - 1994

    Keywords

    • METIS-128983

    Cite this