Low Frequency Noise in Boron Doped Polycrystalline SiGe Thin Film Resistors

X.Y. Chen, Cora Salm, A.D. van Rheenen

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings of IEDMS'98
    Place of PublicationTainan, Taiwan
    Pages242-243
    Number of pages2
    Publication statusPublished - 20 Dec 1998

    Keywords

    • METIS-113836

    Cite this

    Chen, X. Y., Salm, C., & van Rheenen, A. D. (1998). Low Frequency Noise in Boron Doped Polycrystalline SiGe Thin Film Resistors. In Proceedings of IEDMS'98 (pp. 242-243). Tainan, Taiwan.