Low loss, high contrast optical waveguides based on CMOS compatible LPCVD processing

Rene Heideman, D.H. Geuzebroek, Arne Leinse, A. Melloni, F. Morichetti, C.G.H. Roeloffzen, Arjan Meijerink, L. Zhuang, Wim van Etten, E.J. Klein, A. Driessen

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    Abstract

    A new class of integrated optical waveguide structures is presented, based on low cost CMOS compatible LPCVD processing. This technology allows for medium and high index contrast waveguides with very low channel attenuation. The geometry is basically formed by a rectangular cross-section silicon nitride $(Si_{3}N_{4})$ filled with and encapsulated by silicon dioxide $(SiO_{2})$. The birefringence and minimal bend radius of the waveguide is completely controlled by the geometry of the waveguide layer structures. Experiments on typical geometries will be presented, showing excellent characteristics (channel attenuation ≤0.06 dB/cm, IL ≤0.6 dB, PDL ≤0.2 dB, Bg «1 x $10^{-3}$, bend radius ≤500 μm).
    Original languageUndefined
    Title of host publicationProceedings European Conference on Integrated Optics (ECIO)
    Place of PublicationCopenhagen, Denmark
    PublisherTechnical University of Denmark
    PagesWB0-42
    Number of pages6
    ISBN (Print)not assigned
    Publication statusPublished - 27 Apr 2007
    Event13th European Conference on Integrated Optics, ECIO 2007 - Copenhagen, Netherlands
    Duration: 25 Apr 200727 Apr 2007
    Conference number: 13

    Publication series

    Name
    PublisherTechnical University of Denmark
    NumberLNCS4549

    Conference

    Conference13th European Conference on Integrated Optics, ECIO 2007
    Abbreviated titleECIO
    CountryNetherlands
    CityCopenhagen
    Period25/04/0727/04/07

    Keywords

    • IOMS-PIT: PHOTONICS INTEGRATION TECHNOLOGY
    • METIS-241948
    • EWI-11138
    • IR-64378

    Cite this

    Heideman, R., Geuzebroek, D. H., Leinse, A., Melloni, A., Morichetti, F., Roeloffzen, C. G. H., ... Driessen, A. (2007). Low loss, high contrast optical waveguides based on CMOS compatible LPCVD processing. In Proceedings European Conference on Integrated Optics (ECIO) (pp. WB0-42). Copenhagen, Denmark: Technical University of Denmark.