Low-loss reactive sputter deposited titanium oxide waveguides

Alvaro Aguirre-Fontenla, Ivo Hegeman, Ward A.P.M. Hendriks, Meindert Dijkstra, Sonia M.Garcia Blanco

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Abstract

In this work, the fabrication process of optical channel waveguides in titanium dioxide is optimized, including the sputter deposition of titanium dioxide, the reflow of the electron-beam resist and annealing of the etched waveguides. The propagation losses of the films and fully etched strip waveguides had values below 1 dB/cm at wavelengths above 633 nm with propagation losses as low as 0.5 dB/cm at 1550 nm.

Original languageEnglish
Title of host publication2021 IEEE 17th International Conference on Group IV Photonics, GFP 2021 - Proceedings
PublisherIEEE
ISBN (Electronic)9781665422246
DOIs
Publication statusPublished - 20 Jan 2022
Event2021 IEEE 17th International Conference on Group IV Photonics (GFP) - Virtual, Online, Spain
Duration: 7 Dec 202110 Dec 2021

Publication series

NameIEEE International Conference on Group IV Photonics GFP
Volume2021-December
ISSN (Print)1949-2081

Conference

Conference2021 IEEE 17th International Conference on Group IV Photonics (GFP)
Country/TerritorySpain
Period7/12/2110/12/21

Keywords

  • Amorphous
  • Anatase
  • Low Loss
  • Sputtering
  • Titanium Dioxide
  • Waveguide
  • 22/2 OA procedure

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