Low-loss reactive sputter deposited titanium oxide waveguides

Alvaro Aguirre-Fontenla, Ivo Hegeman, Ward A.P.M. Hendriks, Meindert Dijkstra, Sonia M.Garcia Blanco

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

61 Downloads (Pure)

Abstract

In this work, the fabrication process of optical channel waveguides in titanium dioxide is optimized, including the sputter deposition of titanium dioxide, the reflow of the electron-beam resist and annealing of the etched waveguides. The propagation losses of the films and fully etched strip waveguides had values below 1 dB/cm at wavelengths above 633 nm with propagation losses as low as 0.5 dB/cm at 1550 nm.

Original languageEnglish
Title of host publication2021 IEEE 17th International Conference on Group IV Photonics, GFP 2021 - Proceedings
PublisherIEEE
ISBN (Electronic)9781665422246
DOIs
Publication statusPublished - 20 Jan 2022
Event2021 IEEE 17th International Conference on Group IV Photonics (GFP) - Virtual, Online, Spain
Duration: 7 Dec 202110 Dec 2021

Publication series

NameIEEE International Conference on Group IV Photonics GFP
Volume2021-December
ISSN (Print)1949-2081

Conference

Conference2021 IEEE 17th International Conference on Group IV Photonics (GFP)
Country/TerritorySpain
Period7/12/2110/12/21

Keywords

  • Amorphous
  • Anatase
  • Low Loss
  • Sputtering
  • Titanium Dioxide
  • Waveguide
  • 22/2 OA procedure

Fingerprint

Dive into the research topics of 'Low-loss reactive sputter deposited titanium oxide waveguides'. Together they form a unique fingerprint.

Cite this