Low specific contact resistance of NiSi and PtSi to Si: impact of interface

N. Tiggelman, A.Y. Kovalgin, R. Brennan, R.A.M. Wolters

    Research output: Contribution to journalArticleAcademicpeer-review

    2 Citations (Scopus)

    Abstract

    We recently reported low specific contact resistance values of NiSi and PtSi to silicon. In recent publications, such low values were attributed to dopant segregation. In this work, we tested this hypothesis by spreading resistance probe and secondary ion mass spectroscopy analyses. The observed weak dopant segregation could not explain lowering the contact resistance by orders of magnitude. Interface damage, intentionally created using Ni ion implantation, led to an increase of contact resistance (1–2 orders). We conclude that the low contact resistance is intrinsic to a high-quality silicide-silicon interface and can be obtained without active dopant segregation.
    Original languageEnglish
    Pages (from-to)H450-H453
    Number of pages4
    JournalElectrochemical and solid-state letters
    Volume13
    Issue number12
    DOIs
    Publication statusPublished - 30 Sep 2010

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