Low Temperature SiO2 films deposited by Multipolar ECR PECVD

I.G. Isai, Alexeij Y. Kovalgin, J. Holleman, R. Dekker, P.H. Woerlee, Hans Wallinga

    Research output: Other contributionOther research output

    Original languageUndefined
    Place of PublicationVeldhoven, The Netherlands
    Publication statusPublished - 19 Dec 2000

    Keywords

    • METIS-114862

    Cite this

    Isai, I. G., Kovalgin, A. Y., Holleman, J., Dekker, R., Woerlee, P. H., & Wallinga, H. (2000, Dec 19). Low Temperature SiO2 films deposited by Multipolar ECR PECVD. Veldhoven, The Netherlands.