Low Temperature SiO2 films deposited by Multipolar ECR PECVD

I.G. Isai, Alexeij Y. Kovalgin, J. Holleman, R. Dekker, P.H. Woerlee, Hans Wallinga

    Research output: Other contribution › Other research output

    Original languageUndefined
    Place of PublicationVeldhoven, The Netherlands
    Publication statusPublished - 19 Dec 2000

    Keywords

    • METIS-114862

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