Low temperature thin films for next-generation microelectronics (invited)

Jurriaan Schmitz* (Corresponding Author)

*Corresponding author for this work

    Research output: Contribution to journalArticleAcademicpeer-review

    24 Citations (Scopus)
    180 Downloads (Pure)

    Abstract

    In this article the current methodologies for low-temperature thin film deposition in microelectronics are reviewed. The paper discusses the high temperature processes in microchip manufacturing and describes the thermal budget fitting issue. The quest for low temperature deposition techniques is motivated in the perspective of contemporary trends in microchip technology such as 3D integration and the ending miniaturization. Reduced temperature depositions tend to deliver lower quality films. This is illustrated with the relation between deposition temperature and thin dielectric film quality (dielectric strength). Existing and emerging technologies for low-temperature thin film deposition are reviewed with an emphasis on their applicability in microelectronic fabrication.

    Original languageEnglish
    Pages (from-to)83-88
    Number of pages6
    JournalSurface and coatings technology
    Volume343
    DOIs
    Publication statusPublished - 15 Jun 2018

    Keywords

    • Coatings
    • Deposition
    • Integrated circuits
    • Thermal budget
    • Thermal effects
    • Thin films

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