LPCVD conditions generating an intense homogeneous decomposition of silane in the temperature range of 500-630 degrees C

C. Cobianu, P. Cosmin, R. Plugaru, J. Holleman, D. Dascula

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings of thirteenth international conference on Chemical Vapor Deposition - CVD XIII
    Place of PublicationLos Angeles
    Publication statusPublished - 5 May 1996


    • METIS-113884

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