LPCVD conditions generating an intense homogeneous decomposition of silane in the temperature range of 500-630 degrees C

C. Cobianu, P. Cosmin, R. Plugaru, J. Holleman, D. Dascula

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	Undefined
Title of host publication	Proceedings of thirteenth international conference on Chemical Vapor Deposition - CVD XIII
Place of Publication	Los Angeles
Pages	300-305
Publication status	Published - 5 May 1996

Keywords

@inproceedings{678f52c5a04b432f97b1c6b2b496e9a3,

title = "LPCVD conditions generating an intense homogeneous decomposition of silane in the temperature range of 500-630 degrees C",

keywords = "METIS-113884",

author = "C. Cobianu and P. Cosmin and R. Plugaru and J. Holleman and D. Dascula",

year = "1996",

month = may,

day = "5",

language = "Undefined",

isbn = "1-56677-155-2",

pages = "300--305",

booktitle = "Proceedings of thirteenth international conference on Chemical Vapor Deposition - CVD XIII",

}

Proceedings of thirteenth international conference on Chemical Vapor Deposition - CVD XIII. Los Angeles, 1996. p. 300-305.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - LPCVD conditions generating an intense homogeneous decomposition of silane in the temperature range of 500-630 degrees C

AU - Cobianu, C.

AU - Cosmin, P.

AU - Plugaru, R.

AU - Holleman, J.

AU - Dascula, D.

PY - 1996/5/5

Y1 - 1996/5/5

KW - METIS-113884

M3 - Conference contribution

SN - 1-56677-155-2

SP - 300

EP - 305

BT - Proceedings of thirteenth international conference on Chemical Vapor Deposition - CVD XIII

CY - Los Angeles

ER -