LPCVD of GexSi1-x films using SiH4 and GeH4 source gases

Alexeij Y. Kovalgin, J. Holleman, Cora Salm, P.H. Woerlee, Y.V. Ponomarev

    Research output: Other contributionOther research output

    Original languageUndefined
    Place of PublicationEnschede, the Netherlands
    Publication statusPublished - 26 Jun 1998

    Keywords

    • METIS-114923

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