LPCVD of GexSi1-x films using SiH4 and GeH4 source gases

Alexeij Y. Kovalgin, J. Holleman, Cora Salm, P.H. Woerlee, Y.V. Ponomarev

    Research output: Other contributionOther research output

    Original languageUndefined
    Place of PublicationEnschede, the Netherlands
    Publication statusPublished - 26 Jun 1998

    Keywords

    • METIS-114923

    Cite this

    Kovalgin, A. Y., Holleman, J., Salm, C., Woerlee, P. H., & Ponomarev, Y. V. (1998, Jun 26). LPCVD of GexSi1-x films using SiH4 and GeH4 source gases. Enschede, the Netherlands.
    Kovalgin, Alexeij Y. ; Holleman, J. ; Salm, Cora ; Woerlee, P.H. ; Ponomarev, Y.V. / LPCVD of GexSi1-x films using SiH4 and GeH4 source gases. 1998. Enschede, the Netherlands.
    @misc{8c1874e39abe4eb9b8b449e9148b16a3,
    title = "LPCVD of GexSi1-x films using SiH4 and GeH4 source gases",
    keywords = "METIS-114923",
    author = "Kovalgin, {Alexeij Y.} and J. Holleman and Cora Salm and P.H. Woerlee and Y.V. Ponomarev",
    year = "1998",
    month = "6",
    day = "26",
    language = "Undefined",
    type = "Other",

    }

    Kovalgin, AY, Holleman, J, Salm, C, Woerlee, PH & Ponomarev, YV 1998, LPCVD of GexSi1-x films using SiH4 and GeH4 source gases. Enschede, the Netherlands.

    LPCVD of GexSi1-x films using SiH4 and GeH4 source gases. / Kovalgin, Alexeij Y.; Holleman, J.; Salm, Cora; Woerlee, P.H.; Ponomarev, Y.V.

    Enschede, the Netherlands. 1998, .

    Research output: Other contributionOther research output

    TY - GEN

    T1 - LPCVD of GexSi1-x films using SiH4 and GeH4 source gases

    AU - Kovalgin, Alexeij Y.

    AU - Holleman, J.

    AU - Salm, Cora

    AU - Woerlee, P.H.

    AU - Ponomarev, Y.V.

    PY - 1998/6/26

    Y1 - 1998/6/26

    KW - METIS-114923

    M3 - Other contribution

    CY - Enschede, the Netherlands

    ER -