LPCVD of GeXSi1-x Films Using SiH4 and GeH4 Source Gases

Alexeij Y. Kovalgin, J. Holleman, Cora Salm, P.H. Woerlee, Y.V. Ponomarev

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings of the SAFE'98
    Place of PublicationMierlo, the Netherlands
    Number of pages7
    Publication statusPublished - 26 Nov 1998


    • METIS-113882

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