LPCVD SiO2 layers prepared from SiH4 and O2 at 450 degrees C in a rapid thermal processing reactor

C. Cobianu, J.B. Rem, J.H. Klootwijk, Marcel H.H. Weusthof, J. Holleman, P.H. Woerlee

Research output: Other contribution › Other research output

Keywords

@misc{34e8c70554ee4b0c87460a8c1fc3a45b,

title = "LPCVD SiO2 layers prepared from SiH4 and O2 at 450 degrees C in a rapid thermal processing reactor",

keywords = "METIS-114871",

author = "C. Cobianu and J.B. Rem and J.H. Klootwijk and Weusthof, {Marcel H.H.} and J. Holleman and P.H. Woerlee",

year = "1995",

month = sep,

day = "10",

language = "Undefined",

type = "Other",

}