Magnetic Microstructure of Sputtered Co-Cr Films

P. ten Berge; P. ten Berge; J.C. Lodder; R. Plößl; J.N. Chapmann

doi:10.1016/0304-8853(93)91362-B

Magnetic Microstructure of Sputtered Co-Cr Films

P. ten Berge, P. ten Berge, J.C. Lodder, R. Plößl, J.N. Chapmann

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Abstract

The magnetic microstructure of a thickness series of Co81Cr19 layers on Si3N4 membranes is investigated by modified differential phase contrast (MDPC) microscopy. The development from cross-rie wall structures for a thickness < 25 nm to more complicated structures for a thickness > 50 nm is related to the macroscopic VSM measurements and the crystallite orientation determined from electron diffraction experiments.

Original language	Undefined
Pages (from-to)	362-365
Number of pages	5
Journal	Journal of magnetism and magnetic materials
Volume	120
Issue number	120
DOIs	https://doi.org/10.1016/0304-8853(93)91362-B
Publication status	Published - 1993

Keywords

METIS-129078
EWI-5381
SMI-MAT: MATERIALS
SMI-TST: From 2006 in EWI-TST
IR-24278

Access to Document

10.1016/0304-8853(93)91362-B

BERGE1993
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Berge93magnetic
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Cite this

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title = "Magnetic Microstructure of Sputtered Co-Cr Films",

abstract = "The magnetic microstructure of a thickness series of Co81Cr19 layers on Si3N4 membranes is investigated by modified differential phase contrast (MDPC) microscopy. The development from cross-rie wall structures for a thickness < 25 nm to more complicated structures for a thickness > 50 nm is related to the macroscopic VSM measurements and the crystallite orientation determined from electron diffraction experiments.",

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T1 - Magnetic Microstructure of Sputtered Co-Cr Films

AU - ten Berge, P.

AU - Lodder, J.C.

AU - Plößl, R.

AU - Chapmann, J.N.

N1 - Imported from SMI Reference manager

PY - 1993

Y1 - 1993

N2 - The magnetic microstructure of a thickness series of Co81Cr19 layers on Si3N4 membranes is investigated by modified differential phase contrast (MDPC) microscopy. The development from cross-rie wall structures for a thickness < 25 nm to more complicated structures for a thickness > 50 nm is related to the macroscopic VSM measurements and the crystallite orientation determined from electron diffraction experiments.

AB - The magnetic microstructure of a thickness series of Co81Cr19 layers on Si3N4 membranes is investigated by modified differential phase contrast (MDPC) microscopy. The development from cross-rie wall structures for a thickness < 25 nm to more complicated structures for a thickness > 50 nm is related to the macroscopic VSM measurements and the crystallite orientation determined from electron diffraction experiments.

KW - METIS-129078

KW - EWI-5381

KW - SMI-MAT: MATERIALS

KW - SMI-TST: From 2006 in EWI-TST

KW - IR-24278

U2 - 10.1016/0304-8853(93)91362-B

DO - 10.1016/0304-8853(93)91362-B

M3 - Article

VL - 120

SP - 362

EP - 365

JO - Journal of magnetism and magnetic materials

JF - Journal of magnetism and magnetic materials

SN - 0304-8853

IS - 120

ER -