Magnetic properties of electrodeposited Co-W thin films

U. Admon, M.P. Dariel, E. Grunbaum, J.C. Lodder

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    Thin films of Co-W, 300-500 Å thick, were electrodeposited at various compositions under a wide range of plating conditions. The saturation magnetization, coercivity, and squareness ratio of the films were derived from the parallel (in-plane) and perpendicular hysteresis loops, measured by using a vibrating sample magnetometer. The magnetic properties of the films are strongly related to their microstructure. The nonmagnetic alloying elements (W) affects the saturation magnetization via the dilution mechanism. The in-plane coercivity, which increases with increasing content of the hexagonal phase and with decreasing degree of [0001]h texture, is in range of 100-600 Oe for the crystalline deposits and decreases to a few oersteds for amorphous deposits. The in-plane squareness ratio increases with the fcc or amorphous phase content and with decreasing degree of [0001]h texture. The magnetic measurements suggest that films that appeared amorphous according to their electron diffraction patterns are actually microcrystalline or at least partially crystallized.
    Original languageEnglish
    Pages (from-to)1943-1947
    Number of pages5
    JournalJournal of Applied Physics
    Issue number5
    Publication statusPublished - 1987


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