Magnetic stray fields of Co‐Cr microstrips measured by Lorentz microscopy

J.G.Th. te Lintelo, J.C. Lodder, S. McVitie, J.N. Chapman

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    Abstract

    Magnetic stray fields of Co‐Cr microstrips are investigated for bit stabilization in a vertical Bloch line memory (VBLM). The stray fields were revealed using Lorentz force based Foucault and differential phase contrast (DPC) techniques in a transmission electron microscope. The assumed shape of the stray fields for VBLM use has been experimentally verified. Agreement between experiment and simulation is obtained.
    Original languageEnglish
    Pages (from-to)3002-3007
    Number of pages6
    JournalJournal of Applied Physics
    Volume75
    Issue number6
    DOIs
    Publication statusPublished - 1994

    Keywords

    • SMI-TST: From 2006 in EWI-TST
    • SMI-MAT: MATERIALS

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