Manipulating Domain Formation in Ferroelectric BiFeO3 Thin Films by Engineering the Substrate Termination

A. Solmaz, Mark Huijben, B. Noheda, R. Egoavil, J. Verbeeck, Augustinus J.H.M. Rijnders

Research output: Contribution to conference › Poster › Other research output

Original language	English
Pages	-
Publication status	Published - 2014
Event	21st International Workshop on Oxide Electronics, iWOE 2014 - Bolton Landing, United States Duration: 28 Sept 2014 → 1 Oct 2014 Conference number: 21

Conference	21st International Workshop on Oxide Electronics, iWOE 2014
Abbreviated title	iWOE
Country/Territory	United States
City	Bolton Landing
Period	28/09/14 → 1/10/14

Keywords

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title = "Manipulating Domain Formation in Ferroelectric BiFeO3 Thin Films by Engineering the Substrate Termination",

keywords = "METIS-307205",

author = "A. Solmaz and Mark Huijben and B. Noheda and R. Egoavil and J. Verbeeck and Rijnders, {Augustinus J.H.M.}",

year = "2014",

language = "English",

pages = "--",

note = "21st International Workshop on Oxide Electronics, iWOE 2014, iWOE ; Conference date: 28-09-2014 Through 01-10-2014",

}

Manipulating Domain Formation in Ferroelectric BiFeO3 Thin Films by Engineering the Substrate Termination. / Solmaz, A.; Huijben, Mark; Noheda, B. et al.
2014. - Poster session presented at 21st International Workshop on Oxide Electronics, iWOE 2014, Bolton Landing, New York, United States.

Research output: Contribution to conference › Poster › Other research output

TY - CONF

T1 - Manipulating Domain Formation in Ferroelectric BiFeO3 Thin Films by Engineering the Substrate Termination

AU - Solmaz, A.

AU - Huijben, Mark

AU - Noheda, B.

AU - Egoavil, R.

AU - Verbeeck, J.

AU - Rijnders, Augustinus J.H.M.

N1 - Conference code: 21

PY - 2014

Y1 - 2014

KW - METIS-307205

M3 - Poster

SP - -

T2 - 21st International Workshop on Oxide Electronics, iWOE 2014

Y2 - 28 September 2014 through 1 October 2014

ER -