Manipulating Domain Formation in Ferroelectric BiFeO3 Thin Films by Engineering the Substrate Termination

A. Solmaz, Mark Huijben, B. Noheda, R. Egoavil, J. Verbeeck, Augustinus J.H.M. Rijnders

Research output: Contribution to conferencePosterOther research output

Original languageEnglish
Pages-
Publication statusPublished - 2014
Event21st International Workshop on Oxide Electronics, iWOE 2014 - Bolton Landing, United States
Duration: 28 Sep 20141 Oct 2014
Conference number: 21

Conference

Conference21st International Workshop on Oxide Electronics, iWOE 2014
Abbreviated titleiWOE
CountryUnited States
CityBolton Landing
Period28/09/141/10/14

Keywords

  • METIS-307205

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