Mass-balanced through-wafer electrostatic x/y-scanner for parallel probe data storage

Johannes Bernardus Charles Engelen; Hugo E. Rothuizen; Ute Drechsler; Richard Stutz; Michel Despont; Mark A. Lantz

Mass-balanced through-wafer electrostatic x/y-scanner for parallel probe data storage

Johannes Bernardus Charles Engelen, Hugo E. Rothuizen, Ute Drechsler, Richard Stutz, Michel Despont, Mark A. Lantz

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

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Abstract

In this work we describe the design, fabrication and testing of a mass-balanced planar x/y-scanner designed for parallel-probe storage applications (see Fig. 1a). We explore electrostatic actuation as an alternative to electromagnetic actuation. To increase the shock resistance, mass-balancing is used and the scanner is fabricated by deep reactive ion etching through a complete wafer. To move the scan table in both positive and negative x and y directions, four comb drives are used. The comb-drive fingers are tapered to increase the generated force without decreasing the minimum trench width.

Original language	Undefined
Title of host publication	34th International Conference on Micro & Nano Engineering
Place of Publication	Greece
Publisher	Ergo Publications
Pages	92
Number of pages	1
ISBN (Print)	not assigned
Publication status	Published - 2008
Event	34th International Conference on Micro & Nano Engineering, MNE 2008 - Athens, Greece Duration: 15 Sep 2008 → 19 Sep 2008 Conference number: 34

Publication series

Name
Publisher	Ergo Publications
Number	412

Conference

Conference	34th International Conference on Micro & Nano Engineering, MNE 2008
Abbreviated title	MNE
Country	Greece
City	Athens
Period	15/09/08 → 19/09/08

Keywords

TST-uSPAM: micro Scanning Probe Array Memory
TST-SMI: Formerly in EWI-SMI
METIS-255441
IR-65284
EWI-14849

Access to Document

JBC_Engelen_Abstract_MNE2008
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JBC_Engelen_Abstract_MNE2008
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Cite this

@inproceedings{2d68e9323b7840e09e3766143ba82a21,

title = "Mass-balanced through-wafer electrostatic x/y-scanner for parallel probe data storage",

abstract = "In this work we describe the design, fabrication and testing of a mass-balanced planar x/y-scanner designed for parallel-probe storage applications (see Fig. 1a). We explore electrostatic actuation as an alternative to electromagnetic actuation. To increase the shock resistance, mass-balancing is used and the scanner is fabricated by deep reactive ion etching through a complete wafer. To move the scan table in both positive and negative x and y directions, four comb drives are used. The comb-drive fingers are tapered to increase the generated force without decreasing the minimum trench width.",

keywords = "TST-uSPAM: micro Scanning Probe Array Memory, TST-SMI: Formerly in EWI-SMI, METIS-255441, IR-65284, EWI-14849",

author = "Engelen, {Johannes Bernardus Charles} and Rothuizen, {Hugo E.} and Ute Drechsler and Richard Stutz and Michel Despont and Lantz, {Mark A.}",

year = "2008",

language = "Undefined",

isbn = "not assigned",

publisher = "Ergo Publications",

number = "412",

pages = "92",

booktitle = "34th International Conference on Micro & Nano Engineering",

note = "null ; Conference date: 15-09-2008 Through 19-09-2008",

}

Mass-balanced through-wafer electrostatic x/y-scanner for parallel probe data storage. / Engelen, Johannes Bernardus Charles; Rothuizen, Hugo E.; Drechsler, Ute; Stutz, Richard; Despont, Michel; Lantz, Mark A.

34th International Conference on Micro & Nano Engineering. Greece : Ergo Publications, 2008. p. 92.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

TY - GEN

T1 - Mass-balanced through-wafer electrostatic x/y-scanner for parallel probe data storage

AU - Engelen, Johannes Bernardus Charles

AU - Rothuizen, Hugo E.

AU - Drechsler, Ute

AU - Stutz, Richard

AU - Despont, Michel

AU - Lantz, Mark A.

N1 - Conference code: 34

PY - 2008

Y1 - 2008

N2 - In this work we describe the design, fabrication and testing of a mass-balanced planar x/y-scanner designed for parallel-probe storage applications (see Fig. 1a). We explore electrostatic actuation as an alternative to electromagnetic actuation. To increase the shock resistance, mass-balancing is used and the scanner is fabricated by deep reactive ion etching through a complete wafer. To move the scan table in both positive and negative x and y directions, four comb drives are used. The comb-drive fingers are tapered to increase the generated force without decreasing the minimum trench width.

AB - In this work we describe the design, fabrication and testing of a mass-balanced planar x/y-scanner designed for parallel-probe storage applications (see Fig. 1a). We explore electrostatic actuation as an alternative to electromagnetic actuation. To increase the shock resistance, mass-balancing is used and the scanner is fabricated by deep reactive ion etching through a complete wafer. To move the scan table in both positive and negative x and y directions, four comb drives are used. The comb-drive fingers are tapered to increase the generated force without decreasing the minimum trench width.

KW - TST-uSPAM: micro Scanning Probe Array Memory

KW - TST-SMI: Formerly in EWI-SMI

KW - METIS-255441

KW - IR-65284

KW - EWI-14849

M3 - Conference contribution

SN - not assigned

SP - 92

BT - 34th International Conference on Micro & Nano Engineering

PB - Ergo Publications

CY - Greece

Y2 - 15 September 2008 through 19 September 2008

ER -