In this work we describe the design, fabrication and testing of a mass-balanced planar x/y-scanner designed for parallel-probe storage applications (see Fig. 1a). We explore electrostatic actuation as an alternative to electromagnetic actuation. To increase the shock resistance, mass-balancing is used and the scanner is fabricated by deep reactive ion etching through a complete wafer. To move the scan table in both positive and negative x and y directions, four comb drives are used. The comb-drive fingers are tapered to increase the generated force without decreasing the minimum trench width.
|Title of host publication||34th International Conference on Micro & Nano Engineering|
|Place of Publication||Greece|
|Number of pages||1|
|ISBN (Print)||not assigned|
|Publication status||Published - 2008|
|Event||34th International Conference on Micro & Nano Engineering, MNE 2008 - Athens, Greece|
Duration: 15 Sep 2008 → 19 Sep 2008
Conference number: 34
|Conference||34th International Conference on Micro & Nano Engineering, MNE 2008|
|Period||15/09/08 → 19/09/08|
- TST-uSPAM: micro Scanning Probe Array Memory
- TST-SMI: Formerly in EWI-SMI
Engelen, J. B. C., Rothuizen, H. E., Drechsler, U., Stutz, R., Despont, M., & Lantz, M. A. (2008). Mass-balanced through-wafer electrostatic x/y-scanner for parallel probe data storage. In 34th International Conference on Micro & Nano Engineering (pp. 92). Greece: Ergo Publications.