Mechanism of single-shot damage of Ru thin films irradiated by femtosecond extreme UV free-electron laser

Igor Milov (Corresponding Author), Igor A. Makhotkin, Ryszard Sobierajski, Nikita Medvedev, vladimir lipp, Jaromir Chalupsky, Jacobus M. Sturm, Kai Tiedtke, Gosse de Vries, Michael Störmer, Frank Siewert, Robbert van de Kruijs, Eric Louis, Iwanna Jacyna, Marek Jurek, Libor Juha, Věra Hájková, Vojtěch Vozda, Tomáš Burian, Karel SakslBart Faatz, Barbara Keitel, Elke Plönjes, Siegfried Schreiber, Sven Toleikis, R. Loch, Martin Hermann, Sebastian Strobel, Han Kwang Nienhuys, Grzegorz Gwalt, Tobias Mey, Hartmut Enkisch, F. Bijkerk

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Abstract

Ruthenium is a perspective material to be used for XUV mirrors at free-electron laser facilities. Yet, it is still poorly studied in the context of ultrafast laser-matter interaction. In this work, we present single-shot damage studies of thin Ru films irradiated by femtosecond XUV free-electron laser pulses at FLASH. Ex-situ analysis of the damaged spots, performed by different types of microscopy, shows that the weakest detected damage is surface roughening. For higher fluences we observe ablation of Ru. Combined simulations using Monte-Carlo code XCASCADE(3D) and the two-temperature model reveal that the damage mechanism is photomechanical spallation, similar to the case of irradiating the target with optical lasers. The analogy with the optical damage studies enables us to explain the observed damage morphologies.
Original languageEnglish
Pages (from-to)19665-19685
Number of pages21
JournalOptics express
Volume26
Issue number15
DOIs
Publication statusPublished - 23 Jul 2018

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