Mechanism of single-shot damage of Ru thin films irradiated by femtosecond extreme UV free-electron laser

Igor Milov (Corresponding Author), Igor A. Makhotkin, Ryszard Sobierajski, Nikita Medvedev, vladimir lipp, Jaromir Chalupsky, Jacobus M. Sturm, Kai Tiedtke, Gosse de Vries, Michael Störmer, Frank Siewert, Robbert van de Kruijs, Eric Louis, Iwanna Jacyna, Marek Jurek, Libor Juha, Věra Hájková, Vojtěch Vozda, Tomáš Burian, Karel Saksl & 13 others Bart Faatz, Barbara Keitel, Elke Plönjes, Siegfried Schreiber, Sven Toleikis, R. Loch, Martin Hermann, Sebastian Strobel, Han Kwang Nienhuys, Grzegorz Gwalt, Tobias Mey, Hartmut Enkisch, F. Bijkerk

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Abstract

Ruthenium is a perspective material to be used for XUV mirrors at free-electron laser facilities. Yet, it is still poorly studied in the context of ultrafast laser-matter interaction. In this work, we present single-shot damage studies of thin Ru films irradiated by femtosecond XUV free-electron laser pulses at FLASH. Ex-situ analysis of the damaged spots, performed by different types of microscopy, shows that the weakest detected damage is surface roughening. For higher fluences we observe ablation of Ru. Combined simulations using Monte-Carlo code XCASCADE(3D) and the two-temperature model reveal that the damage mechanism is photomechanical spallation, similar to the case of irradiating the target with optical lasers. The analogy with the optical damage studies enables us to explain the observed damage morphologies.
Original languageEnglish
Pages (from-to)19665-19685
Number of pages21
JournalOptics express
Volume26
Issue number15
DOIs
Publication statusPublished - 23 Jul 2018

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ultraviolet lasers
free electron lasers
shot
damage
thin films
spallation
ruthenium
ablation
lasers
fluence
mirrors
microscopy
pulses
simulation
interactions
temperature

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Milov, Igor ; Makhotkin, Igor A. ; Sobierajski, Ryszard ; Medvedev, Nikita ; lipp, vladimir ; Chalupsky, Jaromir ; Sturm, Jacobus M. ; Tiedtke, Kai ; de Vries, Gosse ; Störmer, Michael ; Siewert, Frank ; van de Kruijs, Robbert ; Louis, Eric ; Jacyna, Iwanna ; Jurek, Marek ; Juha, Libor ; Hájková, Věra ; Vozda, Vojtěch ; Burian, Tomáš ; Saksl, Karel ; Faatz, Bart ; Keitel, Barbara ; Plönjes, Elke ; Schreiber, Siegfried ; Toleikis, Sven ; Loch, R. ; Hermann, Martin ; Strobel, Sebastian ; Nienhuys, Han Kwang ; Gwalt, Grzegorz ; Mey, Tobias ; Enkisch, Hartmut ; Bijkerk, F. / Mechanism of single-shot damage of Ru thin films irradiated by femtosecond extreme UV free-electron laser. In: Optics express. 2018 ; Vol. 26, No. 15. pp. 19665-19685.
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title = "Mechanism of single-shot damage of Ru thin films irradiated by femtosecond extreme UV free-electron laser",
abstract = "Ruthenium is a perspective material to be used for XUV mirrors at free-electron laser facilities. Yet, it is still poorly studied in the context of ultrafast laser-matter interaction. In this work, we present single-shot damage studies of thin Ru films irradiated by femtosecond XUV free-electron laser pulses at FLASH. Ex-situ analysis of the damaged spots, performed by different types of microscopy, shows that the weakest detected damage is surface roughening. For higher fluences we observe ablation of Ru. Combined simulations using Monte-Carlo code XCASCADE(3D) and the two-temperature model reveal that the damage mechanism is photomechanical spallation, similar to the case of irradiating the target with optical lasers. The analogy with the optical damage studies enables us to explain the observed damage morphologies.",
author = "Igor Milov and Makhotkin, {Igor A.} and Ryszard Sobierajski and Nikita Medvedev and vladimir lipp and Jaromir Chalupsky and Sturm, {Jacobus M.} and Kai Tiedtke and {de Vries}, Gosse and Michael St{\"o}rmer and Frank Siewert and {van de Kruijs}, Robbert and Eric Louis and Iwanna Jacyna and Marek Jurek and Libor Juha and Věra H{\'a}jkov{\'a} and Vojtěch Vozda and Tom{\'a}š Burian and Karel Saksl and Bart Faatz and Barbara Keitel and Elke Pl{\"o}njes and Siegfried Schreiber and Sven Toleikis and R. Loch and Martin Hermann and Sebastian Strobel and Nienhuys, {Han Kwang} and Grzegorz Gwalt and Tobias Mey and Hartmut Enkisch and F. Bijkerk",
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month = "7",
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Milov, I, Makhotkin, IA, Sobierajski, R, Medvedev, N, lipp, V, Chalupsky, J, Sturm, JM, Tiedtke, K, de Vries, G, Störmer, M, Siewert, F, van de Kruijs, R, Louis, E, Jacyna, I, Jurek, M, Juha, L, Hájková, V, Vozda, V, Burian, T, Saksl, K, Faatz, B, Keitel, B, Plönjes, E, Schreiber, S, Toleikis, S, Loch, R, Hermann, M, Strobel, S, Nienhuys, HK, Gwalt, G, Mey, T, Enkisch, H & Bijkerk, F 2018, 'Mechanism of single-shot damage of Ru thin films irradiated by femtosecond extreme UV free-electron laser' Optics express, vol. 26, no. 15, pp. 19665-19685. https://doi.org/10.1364/OE.26.019665

Mechanism of single-shot damage of Ru thin films irradiated by femtosecond extreme UV free-electron laser. / Milov, Igor (Corresponding Author); Makhotkin, Igor A.; Sobierajski, Ryszard; Medvedev, Nikita; lipp, vladimir; Chalupsky, Jaromir; Sturm, Jacobus M.; Tiedtke, Kai; de Vries, Gosse; Störmer, Michael; Siewert, Frank; van de Kruijs, Robbert; Louis, Eric ; Jacyna, Iwanna; Jurek, Marek; Juha, Libor; Hájková, Věra; Vozda, Vojtěch; Burian, Tomáš; Saksl, Karel; Faatz, Bart; Keitel, Barbara; Plönjes, Elke; Schreiber, Siegfried; Toleikis, Sven; Loch, R.; Hermann, Martin; Strobel, Sebastian; Nienhuys, Han Kwang; Gwalt, Grzegorz; Mey, Tobias; Enkisch, Hartmut; Bijkerk, F.

In: Optics express, Vol. 26, No. 15, 23.07.2018, p. 19665-19685.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Mechanism of single-shot damage of Ru thin films irradiated by femtosecond extreme UV free-electron laser

AU - Milov, Igor

AU - Makhotkin, Igor A.

AU - Sobierajski, Ryszard

AU - Medvedev, Nikita

AU - lipp, vladimir

AU - Chalupsky, Jaromir

AU - Sturm, Jacobus M.

AU - Tiedtke, Kai

AU - de Vries, Gosse

AU - Störmer, Michael

AU - Siewert, Frank

AU - van de Kruijs, Robbert

AU - Louis, Eric

AU - Jacyna, Iwanna

AU - Jurek, Marek

AU - Juha, Libor

AU - Hájková, Věra

AU - Vozda, Vojtěch

AU - Burian, Tomáš

AU - Saksl, Karel

AU - Faatz, Bart

AU - Keitel, Barbara

AU - Plönjes, Elke

AU - Schreiber, Siegfried

AU - Toleikis, Sven

AU - Loch, R.

AU - Hermann, Martin

AU - Strobel, Sebastian

AU - Nienhuys, Han Kwang

AU - Gwalt, Grzegorz

AU - Mey, Tobias

AU - Enkisch, Hartmut

AU - Bijkerk, F.

PY - 2018/7/23

Y1 - 2018/7/23

N2 - Ruthenium is a perspective material to be used for XUV mirrors at free-electron laser facilities. Yet, it is still poorly studied in the context of ultrafast laser-matter interaction. In this work, we present single-shot damage studies of thin Ru films irradiated by femtosecond XUV free-electron laser pulses at FLASH. Ex-situ analysis of the damaged spots, performed by different types of microscopy, shows that the weakest detected damage is surface roughening. For higher fluences we observe ablation of Ru. Combined simulations using Monte-Carlo code XCASCADE(3D) and the two-temperature model reveal that the damage mechanism is photomechanical spallation, similar to the case of irradiating the target with optical lasers. The analogy with the optical damage studies enables us to explain the observed damage morphologies.

AB - Ruthenium is a perspective material to be used for XUV mirrors at free-electron laser facilities. Yet, it is still poorly studied in the context of ultrafast laser-matter interaction. In this work, we present single-shot damage studies of thin Ru films irradiated by femtosecond XUV free-electron laser pulses at FLASH. Ex-situ analysis of the damaged spots, performed by different types of microscopy, shows that the weakest detected damage is surface roughening. For higher fluences we observe ablation of Ru. Combined simulations using Monte-Carlo code XCASCADE(3D) and the two-temperature model reveal that the damage mechanism is photomechanical spallation, similar to the case of irradiating the target with optical lasers. The analogy with the optical damage studies enables us to explain the observed damage morphologies.

U2 - 10.1364/OE.26.019665

DO - 10.1364/OE.26.019665

M3 - Article

VL - 26

SP - 19665

EP - 19685

JO - Optics express

JF - Optics express

SN - 1094-4087

IS - 15

ER -