Memory devices with encapsulated Si nano-crystals: Realization and Characterization.

I. Brunets, T. van Hemert, A. Boogaard, Antonius A.I. Aarnink, Alexeij Y. Kovalgin, J. Holleman, Jurriaan Schmitz

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

    Abstract

    In this work, the advanced non-volatile memory design based on silicon nano-crystals instead of conventional continuous floating gate was explored The multilayer Al/TiN/Al2O3/Si-nano-crystals/Al2O3/SiO2/Si(100) structure was realized. The functional layer stack (TiN/Al2O3/Si-nano-crystals/Al2O3) was deposited in a cluster system without vacuum break, using atomic-layer-deposition (ALD) (Al2O3 and TiN films) and low-pressure chemical-vapor-deposition (LPCVD) (Si nano-crystals) methods. The details of the process flow are discussed. The physical characterization and the electrical measurements of the multilayer structure are presented.
    Original languageUndefined
    Title of host publicationProceedings of the 9th annual workshop on Semiconductor Advances for Future Electronics and Sensors 2006
    Place of PublicationUtrecht, The Netherlands
    PublisherSTW
    Pages419-422
    Number of pages4
    ISBN (Print)978-90-73461-44-4
    Publication statusPublished - 23 Nov 2006
    Event9th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2006 - Veldhoven, Netherlands
    Duration: 23 Nov 200624 Nov 2006
    Conference number: 9

    Publication series

    Name
    PublisherTechnology Foundation STW
    Number10

    Workshop

    Workshop9th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2006
    CountryNetherlands
    CityVeldhoven
    Period23/11/0624/11/06

    Keywords

    • SC-ICF: Integrated Circuit Fabrication
    • IR-63759
    • METIS-237707
    • EWI-8413

    Cite this

    Brunets, I., van Hemert, T., Boogaard, A., Aarnink, A. A. I., Kovalgin, A. Y., Holleman, J., & Schmitz, J. (2006). Memory devices with encapsulated Si nano-crystals: Realization and Characterization. In Proceedings of the 9th annual workshop on Semiconductor Advances for Future Electronics and Sensors 2006 (pp. 419-422). Utrecht, The Netherlands: STW.