In extreme ultraviolet lithography (EUVL) residual tin, in the form of particles, ions, and atoms, can be deposited on nearby EUV optics. During the EUV pulse, a reactive hydrogen plasma is formed, which may be able to react with metal contaminants, creating volatile and unstable metal hydrides that are free to diffuse throughout the vacuum system, spreading the contamination to other optical surfaces. Detailed study of metal and metal hydride surface chemistry is required. Furthermore, to understand the contamination process, hydride formation and hydride dissociation must also be better understood.
|Publication status||Published - 20 Jun 2013|
|Event||14th ASML Technology Conference 2013 - Hotel NH Eindhoven Conference Centre Koningshof, Eindhoven, Netherlands|
Duration: 20 Jun 2013 → 20 Jun 2013
Conference number: 14
|Conference||14th ASML Technology Conference 2013|
|Period||20/06/13 → 20/06/13|