Method for manufacturing a multilayer structure with a lateral pattern for application in the XUV wavelength range, and BF and LMAG structures manufactured according to this method

Frederik Bijkerk (Inventor), Wilfred Gerard van der Wiel (Inventor), R. van der Meer (Inventor), P.E. Hegeman (Inventor)

Research output: Patent

Original languageEnglish
Patent number10769182.3
Publication statusSubmitted - 2010


  • METIS-316945

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